⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Charcoal, Activated SCHEMBL8036863 | 0.98 | — | — | |
| SCHEMBL8976633 | 0.86 | — | — | |
| SCHEMBL7645795 | 0.86 | — | — | |
| SCHEMBL8608275 | 0.84 | TTR (0.33) | — | |
| SCHEMBL823887 | 0.84 | TTR (0.33) | — | |
| SCHEMBL818753 | 0.84 | BRD9 (0.31) | — | |
| SCHEMBL9644548 | 0.84 | STAT3 (0.41) | — | |
| Hydrochloric Acid SCHEMBL7749007 | 0.83 | TTR (0.33) | — | |
| SCHEMBL7103287 | 0.83 | PKLR (0.36) | — | |
| SCHEMBL7103290 | 0.83 | TTR (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 191 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5705322-A | PHENOLIC RESIN, O-DIAZONAPHTHOQUINONE DERIVATIVE, INFRARED ABSORBER | EASTMAN KODAK COMPANY (US) | 1998-01-06 | — | — | US | claimed |
| EP-0442952-B1 | POSITIVE-WORKING PHOTORESISTS EMPLOYING A SELECTED MIXTURE OF ETHYL LACTATE AND ETHYL 3-ETHOXY PROPIONATE AS CASTING SOLVENT | OCG MICROELECTRONIC MATERIALS, INC. (US) | 1993-02-10 | — | — | EP | claimed |
| US-5075194-A | Positive photoresist composition containing 4,4-diester, 4,5-diester, or 5,5-diester of spiroglycol and 1-oxo-2-diazonaphthalene-5-sulfonic acid chloride | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 1991-12-24 | — | — | US | claimed |
| EP-0442952-A4 | POSITIVE-WORKING PHOTORESISTS EMPLOYING A SELECTED MIXTURE OF ETHYL LACTATE AND ETHYL 3-ETHOXY PROPIONATE AS CASTING SOLVENT | — | 1991-09-11 | — | — | EP | claimed |
| EP-0442952-A1 | POSITIVE-WORKING PHOTORESISTS EMPLOYING A SELECTED MIXTURE OF ETHYL LACTATE AND ETHYL 3-ETHOXY PROPIONATE AS CASTING SOLVENT. | OCG MICROELECTRONICS MATERIALS (US) | 1991-08-28 | — | — | EP | claimed |
| US-4965167-A | Positive-working photoresist employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent | OLIN HUNT SPECIALTY PRODUCTS, INC. (US) | 1990-10-23 | — | — | US | claimed |
| WO-1990005325-A1 | POSITIVE-WORKING PHOTORESISTS EMPLOYING A SELECTED MIXTURE OF ETHYL LACTATE AND ETHYL 3-ETHOXY PROPIONATE AS CASTING SOLVENT | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1990-05-17 | — | — | WO | claimed |
| US-4816380-A | Water soluble contrast enhancement layer method of forming resist image on semiconductor chip | TEXAS INSTRUMENTS INCORPORATED (US) | 1989-03-28 | — | — | US | claimed |
| CN-117866205-A | Silicon-containing surface modifier and resist underlayer film composition, and preparation method and application thereof | 福建泓光半导体材料有限公司 | 2024-04-12 | — | — | CN | disclosed |
| CN-116430671-A | Photoresist composition and photoetching process | 上海飞凯材料科技股份有限公司 | 2023-07-14 | — | — | CN | disclosed |
| CN-116406453-A | Radiation sensitive resin composition | 日本瑞翁株式会社 | 2023-07-07 | — | — | CN | disclosed |
| US-20230194984-A1 | FLUORINE-CONTAINING RESIN COMPOSITION AND PREPARATION METHOD THEREOF, AND PREPARATION METHOD OF CURED FILM CONTAINING SAME | XI'AN MANARECO NEW MATERIALS CO., LTD. (CN) | 2023-06-22 | — | — | US | disclosed |
| US-20230109843-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM | ROHM & HAAS ELECT MATERIALS KOREA LTD (KR) | 2023-04-13 | — | — | US | disclosed |
| CN-113840849-B | Resin composition, electronic component, and method for producing resin film | 日本瑞翁株式会社 | 2023-03-28 | — | — | CN | disclosed |
| US-4375507-A | Imaging with nonplanar support multicolor filter elements | EASTMAN KODAK COMPANY (US) | 1983-03-01 | — | — | US | disclosed |
| US-4362806-A | PHOTOGRAPHY, SILVER HALIDE EMULSIONS | EASTMAN KODAK COMPANY (US) | 1982-12-07 | — | — | US | disclosed |
| US-4342151-A | PHOTOPOLYMERIZING THE NEGATIVE-WORKING RESIST | EASTMAN KODAK COMPANY (US) | 1982-08-03 | — | — | US | disclosed |
| US-4247623-A | INTEGRATED CIRCUITS | EASTMAN KODAK COMPANY (US) | 1981-01-27 | — | — | US | disclosed |
| WO-1980001614-A1 | IMAGING ELEMENTS CONTAINING MICROVESSELS AND PROCESSES FOR FORMING IMAGES THEREWITH | EASTMAN KODAK CO (US) | 1980-08-07 | — | — | WO | disclosed |
| US-4108664-A | Light-sensitive negative-working film containing a diazo oxide sensitizer and a p-toluenesulfonyl halide or a 2,4-dihalo-S-triazine | GAF CORPORATION (US) | 1978-08-22 | — | — | US | disclosed |