Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL8976840 | 0.82 | TTR (0.32) | TTR | |
| SCHEMBL8976830 | 0.69 | — | — | |
| Hydrochloric Acid SCHEMBL8976634 | 0.66 | TTR (0.30) | TTR | |
| SCHEMBL30697787 | 0.66 | TTR (0.33) | TTR | |
| SCHEMBL7890125 | 0.65 | TTR (0.34) | TTRCYP1A2 | |
| SCHEMBL24631329 | 0.64 | TTR (0.42) | TTRCYP1A2 | |
| SCHEMBL24631174 | 0.63 | TTR (0.41) | TTRCYP1A2 | |
| Ammonia Solution, Strong SCHEMBL27823874 | 0.63 | TTR (0.41) | TTRCYP1A2 | |
| Hydrochloric Acid SCHEMBL6760307 | 0.62 | PTPRC (0.44) | TTR | |
| SCHEMBL7527437 | 0.62 | PTPRC (0.44) | TTR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0451170-B1 | SELECTED TRINUCLEAR NOVOLAK OLIGOMER DERIVATIVES AS PHOTOACTIVE COMPOUNDS AND THEIR USE IN RADIATION SENSITIVE MIXTURES | OCG MICROELECTRONIC MATERIALS (US) | 1996-04-24 | — | — | EP | disclosed |
| EP-0685766-A1 | Selected trinuclear novolak oligomers and their use in photo-active compounds and radiation sensitive mixtures | OCG MICROELECTRONIC MATERIALS, INC. (US) | 1995-12-06 | — | — | EP | disclosed |
| US-4992356-A | Positive photoresists | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1991-02-12 | — | — | US | disclosed |
| US-4992596-A | Selected trinuclear novolak oligomers and their use in photoactive compounds and radiation sensitive mixtures | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1991-02-12 | — | — | US | disclosed |
| US-4957846-A | PHOTORESISTS, PHOTOLITHOGRAPHY, PRINTED CIRCUITS | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1990-09-18 | — | — | US | disclosed |