SCHEMBL8977079

SCHEMBL8977079

COc1ccc(C(=O)C=Cc2ccc(O)cc2)cc1C

nearest known ligand 0.71

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ABCG2 Q9UNQ0 5/20 0.69
CTSL P07711 1/20 0.66
MAPT P10636 4/20 0.63
MEN1 O00255 3/20 0.63
KMT2A Q03164 3/20 0.63
RAB9A P51151 2/20 0.63
F3 P13726 2/20 0.63
P4HB P07237 1/20 0.63
CALM1 P0DP23 1/20 0.63
ALDH1A1 P00352 1/20 0.63
XDH P47989 1/20 0.63
TNFRSF1A P19438 2/20 0.63
LMNA P02545 1/20 0.61
ATM Q13315 1/20 0.61
NPSR1 Q6W5P4 1/20 0.61
CAPN1 P07384 2/20 0.60
MAOA P21397 2/20 0.60
MAOB P27338 2/20 0.60
PARP1 P09874 1/20 0.60
PDE4A P27815 1/20 0.60

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8977076 1.00 ABCG2 (0.69) ABCG2CTSLMAPTMEN1KMT2A
SCHEMBL8964944 0.92 CTSL (0.74) ABCG2CTSLMAPTMEN1KMT2A
SCHEMBL8964940 0.92 CTSL (0.74) ABCG2CTSLMAPTMEN1KMT2A
SCHEMBL31233066 0.92 CTSL (0.74) ABCG2CTSLMAPTMEN1KMT2A
SCHEMBL8977123 0.89 ABCG2 (0.69) ABCG2CTSLMAPTMEN1KMT2A
SCHEMBL8977121 0.89 ABCG2 (0.69) ABCG2CTSLMAPTMEN1KMT2A
SCHEMBL8977129 0.89 ABCG2 (0.88) ABCG2CTSLMAPTMEN1KMT2A
SCHEMBL8977131 0.89 ABCG2 (0.88) ABCG2CTSLMAPTMEN1KMT2A
SCHEMBL4462137 0.86 ABCG2 (0.61) ABCG2MAPTMEN1KMT2ATNFRSF1A
SCHEMBL4462141 0.86 ABCG2 (0.61) ABCG2MAPTMEN1KMT2ATNFRSF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0428398-B1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-04-03 EP claimed
EP-0428398-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-05-22 EP claimed
EP-0428398-B1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-04-03 EP disclosed
US-5110706-A Photoresists for highly reflective substrates JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-05-05 US disclosed
EP-0428398-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-05-22 EP disclosed