SCHEMBL8977131

SCHEMBL8977131

COc1ccc(C(=O)C=Cc2ccc(O)cc2)cc1OC

nearest known ligand 0.88

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ABCG2 Q9UNQ0 5/20 0.88
TNFRSF1A P19438 3/20 0.79
MEN1 O00255 3/20 0.77
KMT2A Q03164 3/20 0.77
MAPT P10636 3/20 0.77
LMNA P02545 1/20 0.77
ATM Q13315 1/20 0.77
NPSR1 Q6W5P4 1/20 0.77
ABCB1 P08183 1/20 0.72
PDE4A P27815 1/20 0.71
PDE4B Q07343 1/20 0.71
PDE4C Q08493 1/20 0.71
PDE4D Q08499 1/20 0.71
NR1H4 Q96RI1 1/20 0.69
CTSL P07711 1/20 0.69
P4HB P07237 1/20 0.67
CALM1 P0DP23 1/20 0.67
RAB9A P51151 1/20 0.67
ALDH1A1 P00352 1/20 0.67
F3 P13726 1/20 0.67

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8977129 1.00 ABCG2 (0.88) ABCG2TNFRSF1AMEN1KMT2AMAPT
SCHEMBL30415470 0.91 ABCG2 (0.88) ABCG2TNFRSF1AMEN1KMT2AMAPT
SCHEMBL3440660 0.91 ABCG2 (0.88) ABCG2TNFRSF1AMEN1KMT2AMAPT
SCHEMBL30384263 0.91 ABCG2 (0.88) ABCG2TNFRSF1AMEN1KMT2AMAPT
SCHEMBL3440656 0.91 ABCG2 (0.88) ABCG2TNFRSF1AMEN1KMT2AMAPT
SCHEMBL25199646 0.91 ABCG2 (0.88) ABCG2TNFRSF1AMEN1KMT2AMAPT
SCHEMBL30383289 0.91 ABCG2 (0.88) ABCG2TNFRSF1AMEN1KMT2AMAPT
SCHEMBL2458577 0.89 ABCG2 (1.00) ABCG2TNFRSF1AMEN1KMT2AMAPT
SCHEMBL2458579 0.89 ABCG2 (1.00) ABCG2TNFRSF1AMEN1KMT2AMAPT
SCHEMBL8977121 0.89 ABCG2 (0.69) ABCG2TNFRSF1AMEN1KMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0428398-B1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-04-03 EP claimed
US-5110706-A Photoresists for highly reflective substrates JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-05-05 US claimed
EP-0428398-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-05-22 EP claimed
EP-0428398-B1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-04-03 EP disclosed
US-5110706-A Photoresists for highly reflective substrates JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-05-05 US disclosed
EP-0428398-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-05-22 EP disclosed