Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 3/20 | 0.39 |
| ▸ | IDO1 | P14902 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | CTSL | P07711 | 1/20 | 0.36 |
| ▸ | CTSB | P07858 | 1/20 | 0.36 |
| ▸ | CTSK | P43235 | 1/20 | 0.36 |
| ▸ | OPRM1 | P35372 | 2/20 | 0.36 |
| ▸ | OPRL1 | P41146 | 2/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | DPP4 | P27487 | 1/20 | 0.36 |
| ▸ | AGXT | P21549 | 1/20 | 0.35 |
| ▸ | MAOA | P21397 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8879727 | 0.87 | TSHR (0.46) | TSHRIDO1CTSLCTSBCTSK | |
| SCHEMBL27512721 | 0.83 | TSHR (0.43) | MEN1KMT2ATSHRIDO1ALDH1A1 | |
| SCHEMBL31248144 | 0.81 | OPRM1 (0.51) | MEN1KMT2ANPSR1TSHRCTSL | |
| SCHEMBL7461849 | 0.77 | CYP3A4 (0.40) | NPSR1TSHRIDO1ALDH1A1CTSL | |
| SCHEMBL28179070 | 0.76 | OPRM1 (0.47) | MEN1KMT2ANPSR1ALDH1A1MAPK1 | |
| SCHEMBL28072324 | 0.75 | CTSL (0.46) | TSHRCTSLCTSBCTSKOPRM1 | |
| SCHEMBL11244939 | 0.75 | CTSL (0.46) | TSHRCTSLCTSBCTSKOPRM1 | |
| SCHEMBL23462124 | 0.75 | TSHR (0.44) | MEN1KMT2ANPSR1TSHROPRM1 | |
| SCHEMBL22602126 | 0.74 | TSHR (0.38) | TSHRIDO1ALDH1A1CTSLCTSB | |
| SCHEMBL31662687 | 0.73 | CTSL (0.42) | MEN1KMT2ANPSR1CTSLCTSB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0524246-B1 | RESIST MATERIAL AND PROCESS FOR USE | DU PONT (US) | 1996-05-08 | — | — | EP | disclosed |
| US-5219711-A | Positive image formation utilizing resist material with carbazole diazonium salt acid generator | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-06-15 | — | — | US | disclosed |
| US-5212047-A | Resist material and process for use | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-05-18 | — | — | US | disclosed |
| US-5206317-A | RESIST MATERIAL AND PROCESS FOR USE | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-04-27 | — | — | US | disclosed |
| EP-0524246-A1 | RESIST MATERIAL AND PROCESS FOR USE. | DU PONT (US) | 1993-01-27 | — | — | EP | disclosed |
| WO-1991015807-A1 | RESIST MATERIAL WITH CARBAZOLE DIAZONIUM SALT ACID GENERATOR AND PROCESS FOR USE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-10-17 | — | — | WO | disclosed |
| WO-1991015810-A1 | RESIST MATERIAL AND PROCESS FOR USE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-10-17 | — | — | WO | disclosed |
| US-4985332-A | Resist material with carbazole diazonium salt acid generator and process for use | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-01-15 | — | — | US | disclosed |