SCHEMBL8980813

SCHEMBL8980813

CN1C(=O)c2cccc(-c3ccsc3)c2C1=O

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.46
CASP1 P29466 2/20 0.46
KMT2A Q03164 2/20 0.46
USP2 O75604 1/20 0.46
BRCA1 P38398 1/20 0.46
CASP7 P55210 1/20 0.46
MAPT P10636 1/20 0.42
HPGD P15428 1/20 0.42
CASP3 P42574 1/20 0.42
TMIGD3 P0DMS9 1/20 0.41
ADORA2A P29274 1/20 0.41
ADORA1 P30542 1/20 0.41
MAOB P27338 1/20 0.41
PTPRC P08575 1/20 0.41
PRKDC P78527 2/20 0.40
POLB P06746 1/20 0.40
PIK3CD O00329 1/20 0.39
PIK3CA P42336 1/20 0.39
PIK3CB P42338 1/20 0.39
KDM4E B2RXH2 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8980802 0.75 CHEK1 (0.44) USP2CASP7HPGDCASP3TMIGD3
SCHEMBL27554975 0.72 PTPRC (0.54) MEN1KMT2AMAPTHPGDTMIGD3
SCHEMBL15731559 0.72 CYP2A6 (0.42) PTPRC
SCHEMBL9815154 0.72 MEN1 (0.51) MEN1CASP1KMT2AUSP2BRCA1
SCHEMBL3847092 0.71 CES1 (0.47) MEN1KMT2AUSP2CASP7MAPT
SCHEMBL5951475 0.71 ACHE (0.49) TMIGD3ADORA2AADORA1MAOBPTPRC
SCHEMBL13239551 0.71 MEN1 (0.54) MEN1CASP1KMT2AUSP2BRCA1
SCHEMBL2036747 0.71 MEN1 (0.58) MEN1CASP1KMT2AUSP2BRCA1
SCHEMBL26259994 0.69 CYP2A6 (0.52) TMIGD3ADORA2AADORA1MAOBPTPRC
SCHEMBL27510657 0.69 CYP2A6 (0.59) MEN1KMT2ATMIGD3ADORA2AADORA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5494944-A BLEND OF MATERIAL POLYMERIZABLE BY FREE RADICAL CATALYSTAND AN IRON COMPOUND CIBA-GEIGY CORPORATION (US) 1996-02-27 US disclosed
US-5371115-A Having sensitizers, electron acceptors selected from peracids, hydroperoxides and quinones; photosensitive, photoresists CIBA-GEIGY CORPORATION (US) 1994-12-06 US disclosed
US-5124233-A PHOTORESIST COMPOSITIONS CIBA-GEIGY CORPORATION (US) 1992-06-23 US disclosed
US-4935320-A Substrate, thermostable adhesive, self-supporting, photocrosslinkable polyimide film CIBA-GEIGY CORPORATION (US) 1990-06-19 US disclosed
US-4786569-A Adhesively bonded photostructurable polyimide film CIBA-GEIGY CORPORATION (US) 1988-11-22 US disclosed
US-4624912-A EXPOSURE TO ELECTRON OR ACTINIC RADIATION, THEN HEATING CIBA-GEIGY CORPORATION (US) 1986-11-25 US disclosed