Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHEK1 | O14757 | 1/20 | 0.44 |
| ▸ | WEE1 | P30291 | 1/20 | 0.44 |
| ▸ | STK10 | O94804 | 3/20 | 0.43 |
| ▸ | SLK | Q9H2G2 | 3/20 | 0.43 |
| ▸ | GSK3B | P49841 | 2/20 | 0.42 |
| ▸ | PTPRC | P08575 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | PARP1 | P09874 | 1/20 | 0.40 |
| ▸ | TMIGD3 | P0DMS9 | 1/20 | 0.39 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.39 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.39 |
| ▸ | MAOB | P27338 | 1/20 | 0.39 |
| ▸ | CYP2A6 | P11509 | 2/20 | 0.38 |
| ▸ | CYP2B6 | P20813 | 2/20 | 0.38 |
| ▸ | CYP2E1 | P05181 | 1/20 | 0.38 |
| ▸ | CASP3 | P42574 | 2/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3847092 | 0.79 | CES1 (0.47) | CHEK1WEE1STK10SLKGSK3B | |
| SCHEMBL16754925 | 0.77 | GSK3B (0.62) | GSK3BALDH1A1KDM4EGAAHPGD | |
| SCHEMBL9016868 | 0.76 | GSK3B (0.50) | CHEK1WEE1GSK3BALDH1A1KDM4E | |
| SCHEMBL135332 | 0.76 | GSK3B (0.56) | CHEK1WEE1GSK3BALDH1A1KDM4E | |
| SCHEMBL4180952 | 0.75 | CES1 (0.50) | STK10SLKGSK3BPTPRCALDH1A1 | |
| SCHEMBL8980813 | 0.75 | MEN1 (0.46) | PTPRCALDH1A1KDM4EGAAHPGD | |
| Ammonia Solution, Strong SCHEMBL28821133 | 0.74 | GSK3B (0.54) | CHEK1WEE1GSK3BALDH1A1KDM4E | |
| SCHEMBL29032840 | 0.74 | GSK3B (0.54) | CHEK1WEE1GSK3BALDH1A1KDM4E | |
| SCHEMBL27554975 | 0.74 | PTPRC (0.54) | PTPRCALDH1A1KDM4EHPGDHSD17B10 | |
| SCHEMBL2894929 | 0.71 | ALDH1A1 (0.46) | CHEK1WEE1STK10SLKGSK3B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119403840-A | Photocurable composition, method for producing cured film, solid-state imaging element, image display device, and radical polymerization initiator | 富士胶片株式会社 | 2025-02-07 | — | — | CN | disclosed |
| CN-105175315-B | Photo-corrosion-resisting agent composition | 巴斯夫欧洲公司 | 2018-08-28 | — | — | CN | disclosed |
| CN-107207456-A | Latent acid and application thereof | 巴斯夫欧洲公司 | 2017-09-26 | — | — | CN | disclosed |
| CN-106604912-A | Oxime sulfonate derivatives | 巴斯夫欧洲公司 | 2017-04-26 | — | — | CN | disclosed |
| CN-103443072-B | Polymerizable composition comprising oxime sulfonate as thermal curing agent | BASF SE (DE) | 2016-05-18 | — | — | CN | disclosed |
| CN-105175315-A | Photoresist composition | BASF SE | 2015-12-23 | — | — | CN | disclosed |
| CN-102361896-B | Photoresist composition | BASF SE (DE) | 2015-10-07 | — | — | CN | disclosed |
| CN-101641643-B | Photoactivable nitrogen bases | BASF SE | 2013-08-07 | — | — | CN | disclosed |
| CN-102361896-A | Photoresist composition | BASF SE | 2012-02-22 | — | — | CN | disclosed |
| CN-102336081-A | Printing method, method for preparing overprint, method for processing laminate, light-emitting diode curable coating composition, and light-emitting diode curable ink composition | FUJIFILM CORP | 2012-02-01 | — | — | CN | disclosed |
| CN-101641643-A | Photoactivable nitrogen bases | CIBA HOLDING INC DE | 2010-02-03 | — | — | CN | disclosed |
| CN-101473268-A | Oxime sulfonates and the use therof as latent acids | CIBA HOLDING INC (CH) | 2009-07-01 | — | — | CN | disclosed |
| CN-1989455-A | Oxime derivatives and the use therof as latent acids | CIBA SC HOLDING AG (CH) | 2007-06-27 | — | — | CN | disclosed |
| CN-1791473-A | Strongly adherent surface coatings. | CIBA SC HOLDING AG (CH) | 2006-06-21 | — | — | CN | disclosed |
| US-5494944-A | BLEND OF MATERIAL POLYMERIZABLE BY FREE RADICAL CATALYSTAND AN IRON COMPOUND | CIBA-GEIGY CORPORATION (US) | 1996-02-27 | — | — | US | disclosed |
| US-5371115-A | Having sensitizers, electron acceptors selected from peracids, hydroperoxides and quinones; photosensitive, photoresists | CIBA-GEIGY CORPORATION (US) | 1994-12-06 | — | — | US | disclosed |
| US-5124233-A | PHOTORESIST COMPOSITIONS | CIBA-GEIGY CORPORATION (US) | 1992-06-23 | — | — | US | disclosed |
| US-4935320-A | Substrate, thermostable adhesive, self-supporting, photocrosslinkable polyimide film | CIBA-GEIGY CORPORATION (US) | 1990-06-19 | — | — | US | disclosed |
| US-4786569-A | Adhesively bonded photostructurable polyimide film | CIBA-GEIGY CORPORATION (US) | 1988-11-22 | — | — | US | disclosed |
| US-4624912-A | EXPOSURE TO ELECTRON OR ACTINIC RADIATION, THEN HEATING | CIBA-GEIGY CORPORATION (US) | 1986-11-25 | — | — | US | disclosed |