⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13498373 | 0.88 | — | — | |
| SCHEMBL26927712 | 0.86 | CA2 (0.32) | — | |
| SCHEMBL12541324 | 0.86 | CA2 (0.32) | — | |
| SCHEMBL1925455 | 0.83 | — | — | |
| SCHEMBL7260763 | 0.83 | HSD17B10 (0.37) | — | |
| SCHEMBL5542648 | 0.80 | — | — | |
| SCHEMBL10938191 | 0.77 | CES2 (0.42) | — | |
| SCHEMBL631462 | 0.77 | HSD17B10 (0.37) | — | |
| SCHEMBL1035786 | 0.77 | CA2 (0.36) | — | |
| SCHEMBL10031352 | 0.76 | CES2 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9196484-B2 | Silicon-containing composition for formation of resist underlayer film, which contains organic group containing protected aliphatic alcohol | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-11-24 | — | — | US | disclosed |
| US-20130183830-A1 | SILICON-CONTAINING COMPOSITION FOR FORMATION OF RESIST UNDERLAYER FILM, WHICH CONTAINS ORGANIC GROUP CONTAINING PROTECTED ALIPHATIC ALCOHOL | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-07-18 | — | — | US | disclosed |
| US-5550241-A | Adducts of cyclic carbonyl monomers and substituted alkens | EXXON RESEARCH AND ENGINEERING COMPANY (US) | 1996-08-27 | — | — | US | disclosed |