SCHEMBL8997040

SCHEMBL8997040

[CH]=Cc1ccc(O)c(CC=C)c1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 6/20 0.61
GABRB2 P47870 6/20 0.61
POLB P06746 2/20 0.53
GAA P10253 3/20 0.49
MAPT P10636 3/20 0.49
KMT2A Q03164 3/20 0.49
MEN1 O00255 2/20 0.49
CNR1 P21554 2/20 0.49
CNR2 P34972 2/20 0.49
ALOX5 P09917 2/20 0.49
GABRB1 P18505 1/20 0.49
RXRA P19793 1/20 0.49
GABRA5 P31644 1/20 0.49
GABRA3 P34903 1/20 0.49
GABRA2 P47869 1/20 0.49
ACE2 Q9BYF1 1/20 0.49
SIRT3 Q9NTG7 1/20 0.49
AKR1B1 P15121 3/20 0.47
XDH P47989 2/20 0.44
ALDH1A1 P00352 3/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4613626 0.85 GABRA1 (0.66) GABRA1GABRB2POLBGAAMAPT
SCHEMBL1002665 0.81 GABRA1 (0.61) GABRA1GABRB2POLBGAAMAPT
SCHEMBL22296492 0.79 GABRA1 (0.58) GABRA1GABRB2POLBGAAMAPT
SCHEMBL8831026 0.79 KDM4E (0.45) GABRA1GABRB2POLBGAAMAPT
SCHEMBL71514 0.76 GABRA1 (0.70) GABRA1GABRB2POLBGAAMAPT
SCHEMBL30893166 0.76 GABRA1 (0.70) GABRA1GABRB2POLBGAAMAPT
SCHEMBL29892631 0.76 GABRA1 (1.00) GABRA1GABRB2POLBGAAMAPT
SCHEMBL252293 0.76 GABRA1 (1.00) GABRA1GABRB2POLBGAAMAPT
SCHEMBL27948986 0.76 POLB (0.55) GABRA1GABRB2POLBGAAMAPT
SCHEMBL4840084 0.75 AKR1C3 (0.69) GABRA1GABRB2POLBGAAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0501308-B1 Radiation-sensitive polymers with naphthoquinone-2-diazid-4-sulfonyl group and its use in a positive-working recording material HOECHST AG (DE) 1996-09-11 EP disclosed
EP-0605856-B1 Process for the manufacture of p-hydroxystyrene polymers and use thereof BASF AG (DE) 1996-08-28 EP disclosed
EP-0501294-B1 Radiation-sensitive polymers with 2-diazo-1,3-dicarbonyl groups, process for its production and its use in a positive-working recording material HOECHST AG (DE) 1994-10-26 EP disclosed
EP-0605856-A2 Process for the manufacture of p-hydroxystyrene polymers and use thereof BASF Aktiengesellschaft (DE) 1994-07-13 EP disclosed
EP-0501308-A1 Radiation-sensitive polymers with naphthoquinone-2-diazid-4-sulfonyl group and its use in a positive-working recording material HOECHST AKTIENGESELLSCHAFT (DE) 1992-09-02 EP disclosed
EP-0501294-A1 Radiation-sensitive polymers with 2-diazo-1,3-dicarbonyl groups, process for its production and its use in a positive-working recording material HOECHST AKTIENGESELLSCHAFT (DE) 1992-09-02 EP disclosed