Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 6/20 | 0.66 |
| ▸ | GABRB2 | P47870 | 6/20 | 0.66 |
| ▸ | POLB | P06746 | 2/20 | 0.56 |
| ▸ | MEN1 | O00255 | 2/20 | 0.51 |
| ▸ | GAA | P10253 | 2/20 | 0.51 |
| ▸ | MAPT | P10636 | 2/20 | 0.51 |
| ▸ | CNR1 | P21554 | 2/20 | 0.51 |
| ▸ | CNR2 | P34972 | 2/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.51 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.51 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.51 |
| ▸ | RXRA | P19793 | 1/20 | 0.51 |
| ▸ | GABRA5 | P31644 | 1/20 | 0.51 |
| ▸ | GABRA3 | P34903 | 1/20 | 0.51 |
| ▸ | GABRA2 | P47869 | 1/20 | 0.51 |
| ▸ | ACE2 | Q9BYF1 | 1/20 | 0.51 |
| ▸ | SIRT3 | Q9NTG7 | 1/20 | 0.51 |
| ▸ | AKR1B1 | P15121 | 3/20 | 0.50 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.47 |
| ▸ | XDH | P47989 | 2/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8997040 | 0.85 | GABRA1 (0.61) | GABRA1GABRB2POLBMEN1GAA | |
| SCHEMBL1002665 | 0.85 | GABRA1 (0.61) | GABRA1GABRB2POLBMEN1GAA | |
| SCHEMBL13899836 | 0.83 | TRPA1 (0.50) | GABRA1GABRB2POLBMEN1MAPT | |
| SCHEMBL22296492 | 0.82 | GABRA1 (0.58) | GABRA1GABRB2POLBMEN1GAA | |
| SCHEMBL685704 | 0.82 | TRPA1 (0.48) | GABRA1GABRB2POLBTRPA1ALDH1A1 | |
| SCHEMBL30101971 | 0.82 | TRPA1 (0.48) | GABRA1GABRB2POLBTRPA1ALDH1A1 | |
| SCHEMBL15524685 | 0.80 | TRPA1 (0.47) | GABRA1GABRB2POLBMEN1GAA | |
| SCHEMBL685611 | 0.80 | TRPA1 (0.52) | GABRA1GABRB2POLBAKR1B1TRPA1 | |
| SCHEMBL14760945 | 0.80 | TRPA1 (0.47) | GABRA1GABRB2POLBMEN1GAA | |
| SCHEMBL71514 | 0.79 | GABRA1 (0.70) | GABRA1GABRB2POLBMEN1GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023203827-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-10-26 | — | — | WO | disclosed |
| US-9335631-B2 | Photosensitive resin composition, method for manufacturing organic layer using the composition, and display device comprising the organic layer | SAMSUNG DISPLAY CO., LTD. (KR) | 2016-05-10 | — | — | US | disclosed |
| US-20150168833-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING ORGANIC LAYER USING THE COMPOSITION, AND DISPLAY DEVICE COMPRISING THE ORGANIC LAYER | SAMSUNG DISPLAY CO., LTD (KR) | 2015-06-18 | — | — | US | disclosed |
| EP-1913444-B1 | PHOTORESIST COMPOSITION FOR IMAGING THICK FILMS | AZ ELECTRONIC MATERIALS USA (US) | 2013-01-16 | — | — | EP | disclosed |
| EP-1960837-A2 | DEVELOPABLE UNDERCOATING COMPOSITION FOR THICK PHOTORESIST LAYERS | AZ Electronic Materials USA Corp. (US) | 2008-08-27 | — | — | EP | disclosed |
| EP-1913444-A2 | PHOTORESIST COMPOSITION FOR IMAGING THICK FILMS | AZ Electronic Materials USA Corp. (US) | 2008-04-23 | — | — | EP | disclosed |
| US-7255970-B2 | Photoresist composition for imaging thick films | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2007-08-14 | — | — | US | disclosed |
| US-20070160927-A1 | Radiation-sensitive resin composition, process for producing the same and process for producing semiconductor device therewith | SPANSION LLC | 2007-07-12 | — | — | US | disclosed |
| WO-2007054813-A2 | DEVELOPABLE UNDERCOATING COMPOSITION FOR THICK PHOTORESIST LAYERS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-05-18 | — | — | WO | disclosed |
| US-20070105040-A1 | Developable undercoating composition for thick photoresist layers | AZ ELECTRONIC MATERIALS USA CORP. | 2007-05-10 | — | — | US | disclosed |
| US-5342727-A | Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene in admixture with a photosensitizer to form a photosensitive composition | HOECHST CELANESE CORP. (US) | 1994-08-30 | — | — | US | disclosed |
| EP-0605856-A2 | Process for the manufacture of p-hydroxystyrene polymers and use thereof | BASF Aktiengesellschaft (DE) | 1994-07-13 | — | — | EP | disclosed |
| US-5326826-A | Binder | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-07-05 | — | — | US | disclosed |
| US-5302488-A | Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-sulfonyl groups and their use in a positive working recording material | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-04-12 | — | — | US | disclosed |
| EP-0501308-A1 | Radiation-sensitive polymers with naphthoquinone-2-diazid-4-sulfonyl group and its use in a positive-working recording material | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-09-02 | — | — | EP | disclosed |
| EP-0501294-A1 | Radiation-sensitive polymers with 2-diazo-1,3-dicarbonyl groups, process for its production and its use in a positive-working recording material | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-09-02 | — | — | EP | disclosed |
| EP-0365340-A2 | Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene | HOECHST CELANESE CORPORATION (US) | 1990-04-25 | — | — | EP | disclosed |
| US-4097464-A | ABS TERPOLYMERS, SELF-STABILIZING | THE GOODYEAR TIRE & RUBBER COMPANY (US) | 1978-06-27 | — | — | US | disclosed |
| US-4036909-A | Process for the polymerization and copolymerization of vinyl and diene compounds | CESKOSLOVENSKA AKADEMIE VED (CS) | 1977-07-19 | — | — | US | disclosed |
| US-3998910-A | PROCESS FOR THE POLYMERIZATION AND COPOLYMERIZATION OF VINYL AND DIENE COMPOUNDS | CESKOSLOVENSKA AKADEMIE VED (CS) | 1976-12-21 | — | — | US | disclosed |