SCHEMBL9003444

SCHEMBL9003444

CCCC[B-](c1ccccc1)(c1ccccc1)c1ccccc1.O=[S+]C(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.35

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
KCNN4 O15554 1/20 0.33
KIF11 P52732 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8756247 0.86 KCNN4 (0.33) KCNN4KIF11
SCHEMBL9003381 0.81 ALDH1A1 (0.32)
SCHEMBL225939 0.81 TSHR (0.38)
SCHEMBL9003543 0.79 CES1 (0.36) KIF11
SCHEMBL8772308 0.79 TSHR (0.37)
Lithium Ion SCHEMBL503758 0.79 TSHR (0.37)
SCHEMBL7092511 0.79 TSHR (0.37)
SCHEMBL5078343 0.79 TSHR (0.37)
Ammonia Solution, Strong SCHEMBL9771941 0.79 TSHR (0.37)
SCHEMBL9003762 0.78 KCNN4 (0.41) KCNN4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5500453-A INITIATOR FOR PHOTOSENSITIVE FREE RADICAL CURING/ POLYMERIZATION OF UNSATURATED COMPOUNDS TOYO INK MANUFACTURING CO., LTD. (JP) 1996-03-19 US disclosed