SCHEMBL9006495

SCHEMBL9006495

O=C(Oc1cccc2c1C(=O)C=CC2=O)c1ccc(OC(F)=C(F)F)cc1

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TOP1 P11387 3/20 0.67
POLM Q9NP87 2/20 0.44
POLK Q9UBT6 2/20 0.44
POLL Q9UGP5 2/20 0.44
POLH Q9Y253 2/20 0.44
KMT2A Q03164 4/20 0.38
MAPT P10636 3/20 0.38
MEN1 O00255 3/20 0.38
USP2 O75604 2/20 0.38
ALOX15 P16050 2/20 0.38
HSD17B10 Q99714 2/20 0.38
KDM4E B2RXH2 1/20 0.38
AURKA O14965 1/20 0.38
TRPA1 O75762 1/20 0.38
ALDH1A1 P00352 1/20 0.38
TP53 P04637 1/20 0.38
P4HB P07237 1/20 0.38
CYP3A4 P08684 1/20 0.38
THRB P10828 1/20 0.38
PDIA4 P13667 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006775 0.92 TOP1 (0.58) TOP1POLMPOLKPOLLPOLH
SCHEMBL9006672 0.84 TOP1 (0.59) TOP1POLMPOLKPOLLPOLH
SCHEMBL12827331 0.81 TOP1 (1.00) TOP1POLMPOLKPOLLPOLH
SCHEMBL5821897 0.80 TOP1 (0.76) TOP1POLMPOLKPOLLPOLH
SCHEMBL9006611 0.76 MAPT (0.40) TOP1KMT2AMAPTMEN1HSD17B10
SCHEMBL13422469 0.72 PARP10 (0.59) KMT2AMAPTMEN1HSD17B10ALDH1A1
SCHEMBL9006707 0.71 CYP2A6 (0.50) KMT2AMAPTMEN1ALOX15ALDH1A1
SCHEMBL9006604 0.71 CYP2A6 (0.47) KMT2AMAPTMEN1ALOX15KDM4E
SCHEMBL1287104 0.70 TOP1 (0.65) TOP1POLMPOLKPOLLPOLH
SCHEMBL13422221 0.68 PARP10 (0.54) KMT2AMAPTMEN1KDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US claimed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO disclosed