SCHEMBL9006604

SCHEMBL9006604

O=C(Oc1cccc2oc(=O)ccc12)c1ccc(OC(F)=C(F)F)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP2A6 P11509 5/20 0.47
▸ CA9 Q16790 4/20 0.44
▸ CA12 O43570 3/20 0.44
▸ KMT2A Q03164 6/20 0.43
▸ POLB P06746 1/20 0.43
▸ KCNA3 P22001 1/20 0.43
▸ GBA1 P04062 2/20 0.42
▸ CYP3A4 P08684 2/20 0.41
▸ ESR1 P03372 1/20 0.41
▸ ESR2 Q92731 1/20 0.41
▸ ALDH1A1 P00352 2/20 0.40
▸ KDM4E B2RXH2 1/20 0.40
▸ GLA P06280 1/20 0.40
▸ GAA P10253 1/20 0.40
▸ MAPT P10636 1/20 0.40
▸ NPBWR1 P48145 1/20 0.40
▸ EPHX2 P34913 1/20 0.40
▸ MEN1 O00255 3/20 0.39
▸ TP53 P04637 1/20 0.39
▸ TSHR P16473 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006779 0.85 CYP2A6 (0.59) CYP2A6CA9CA12KMT2AKCNA3
SCHEMBL9006707 0.81 CYP2A6 (0.50) CYP2A6CA9CA12KMT2APOLB
SCHEMBL9006755 0.77 KMT2A (0.70) CA9CA12KMT2APOLBGBA1
SCHEMBL9006578 0.76 CA12 (0.70) CYP2A6CA9CA12KMT2APOLB
SCHEMBL16283607 0.72 CYP2A6 (0.66) CYP2A6CA9CA12KMT2APOLB
SCHEMBL9006495 0.71 TOP1 (0.67) KMT2APOLBCYP3A4ESR1ESR2
SCHEMBL13422469 0.70 PARP10 (0.59) KMT2AALDH1A1MAPTMEN1
SCHEMBL14330333 0.69 CYP2A6 (0.60) CYP2A6CA9CA12KMT2APOLB
SCHEMBL29468148 0.67 KMT2A (0.68) CA9CA12KMT2APOLBKCNA3
SCHEMBL13422221 0.67 PARP10 (0.54) KMT2AALDH1A1KDM4EMAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 — — US claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 — — US claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 — — US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 — — EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 — — US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 — — WO disclosed
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