SCHEMBL9006601

SCHEMBL9006601

C=CC(=O)c1ccc(OC(F)=C(F)F)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH5A1 P51649 1/20 0.50
ABAT P80404 1/20 0.50
AKT1 P31749 1/20 0.47
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
ALDH1A1 P00352 2/20 0.43
MAPT P10636 2/20 0.43
HPGD P15428 2/20 0.43
KDM4E B2RXH2 1/20 0.43
EGFR P00533 1/20 0.43
TP53 P04637 1/20 0.43
CYP3A4 P08684 1/20 0.43
PKM P14618 1/20 0.43
ALOX15 P16050 1/20 0.43
ALOX12 P18054 1/20 0.43
JAK1 P23458 1/20 0.43
MAPK1 P28482 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
HSD17B10 Q99714 1/20 0.43
TDP1 Q9NUW8 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006451 0.88 THRB (0.43) ALDH5A1ABATAKT1MEN1KMT2A
SCHEMBL9006567 0.83 THRB (0.51) MEN1KMT2AALDH1A1MAPTHPGD
SCHEMBL18619583 0.81 ALDH5A1 (0.57) ALDH5A1ABATAKT1MEN1KMT2A
SCHEMBL5309873 0.79 ELANE (0.52) MEN1KMT2AMAPTHPGDMAPK1
SCHEMBL9006639 0.78 F3 (0.61) MEN1KMT2AALDH1A1MAPTCYP3A4
SCHEMBL9242507 0.78 F3 (0.61) MEN1KMT2AALDH1A1MAPTCYP3A4
SCHEMBL9243543 0.78 F3 (0.61) MEN1KMT2AALDH1A1MAPTCYP3A4
SCHEMBL9242503 0.78 F3 (0.61) MEN1KMT2AALDH1A1MAPTCYP3A4
SCHEMBL9006625 0.78 F3 (0.61) MEN1KMT2AALDH1A1MAPTCYP3A4
SCHEMBL14903558 0.78 ELANE (0.56) ALDH5A1ABATAKT1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO disclosed