SCHEMBL9006567

SCHEMBL9006567

C=CC(=O)Oc1ccc(OC(F)=C(F)F)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 4/20 0.51
THRA P10827 1/20 0.36
PDE6D O43924 1/20 0.35
TYMS P04818 1/20 0.35
TGM2 P21980 2/20 0.33
RAB9A P51151 1/20 0.33
LMNA P02545 1/20 0.32
KMT2A Q03164 3/20 0.32
HSD17B10 Q99714 2/20 0.32
KDM4E B2RXH2 1/20 0.32
MEN1 O00255 1/20 0.32
ALDH1A1 P00352 1/20 0.32
EGFR P00533 1/20 0.32
TP53 P04637 1/20 0.32
CYP3A4 P08684 1/20 0.32
MAPT P10636 1/20 0.32
PKM P14618 1/20 0.32
HPGD P15428 1/20 0.32
ALOX15 P16050 1/20 0.32
ALOX12 P18054 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006626 0.87 THRB (0.45) THRBTHRARAB9AKMT2AMEN1
SCHEMBL2587522 0.85 THRB (0.64) THRBTHRAPDE6DTYMSTGM2
SCHEMBL9006601 0.83 ALDH5A1 (0.50) THRBTHRAKMT2AHSD17B10KDM4E
SCHEMBL2578957 0.80 THRB (0.51) THRBPDE6DKMT2AHSD17B10KDM4E
SCHEMBL9006593 0.80 THRB (0.46) THRBRAB9ALMNAKMT2AHSD17B10
SCHEMBL4530562 0.80 RAB9A (0.35) RAB9ALMNAKMT2AHSD17B10MEN1
SCHEMBL2975869 0.79 THRB (0.55) THRBTHRATGM2KMT2AKDM4E
SCHEMBL4393026 0.79 THRB (0.55) THRBTHRAPDE6DTYMSTGM2
SCHEMBL9006430 0.79 TGM2 (0.61) THRBTHRATGM2LMNAKMT2A
SCHEMBL802752 0.79 THRB (0.58) THRBTHRAPDE6DTGM2RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO disclosed