SCHEMBL9006680

SCHEMBL9006680

CC1C/C(=C/c2ccc(Cl)cc2C(=O)O)C(=O)/C(=C/c2ccc(OC(F)=C(F)F)cc2)C1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 4/20 0.37
RAB9A P51151 4/20 0.37
MAPT P10636 4/20 0.37
MAPK1 P28482 3/20 0.37
HTT P42858 2/20 0.37
HSP90AA1 P07900 1/20 0.37
KMT2A Q03164 4/20 0.35
MEN1 O00255 3/20 0.35
NOD2 Q9HC29 1/20 0.35
EGFR P00533 1/20 0.35
ALDH1A1 P00352 2/20 0.34
LMNA P02545 2/20 0.34
KDM4E B2RXH2 1/20 0.34
PKM P14618 1/20 0.33
MITF O75030 2/20 0.33
CCR6 P51684 1/20 0.33
NSD2 O96028 1/20 0.33
ATM Q13315 1/20 0.33
POLB P06746 1/20 0.32
CLK1 P49759 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006610 0.87 EGFR (0.46) MAPTHTTKMT2AMEN1EGFR
SCHEMBL9006505 0.82 MAPT (0.52) NPC1RAB9AMAPTMAPK1HTT
SCHEMBL9006514 0.82 MAPT (0.52) NPC1RAB9AMAPTMAPK1HTT
SCHEMBL9006623 0.78 MAPT (0.48) NPC1RAB9AMAPTMAPK1HTT
SCHEMBL9006627 0.78 MAPT (0.48) NPC1RAB9AMAPTMAPK1HTT
SCHEMBL9006687 0.77 CCR6 (0.38) NPC1RAB9AMAPTMAPK1HTT
SCHEMBL9006491 0.77 MAPT (0.47) NPC1RAB9AMAPTMAPK1HTT
SCHEMBL9006499 0.77 MAPT (0.47) NPC1RAB9AMAPTMAPK1HTT
SCHEMBL9006515 0.77 MAPT (0.42) NPC1RAB9AMAPTMAPK1HTT
SCHEMBL9006508 0.77 MAPT (0.42) NPC1RAB9AMAPTMAPK1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US claimed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US claimed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO disclosed