SCHEMBL9006409

SCHEMBL9006409

Nc1ccc(OC(F)=C(F)F)c2ccc(=O)oc12

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA9 Q16790 4/20 0.37
▸ CA12 O43570 1/20 0.37
▸ CA1 P00915 1/20 0.37
▸ CA2 P00918 1/20 0.37
▸ CA7 P43166 1/20 0.37
▸ CA13 Q8N1Q1 1/20 0.37
▸ MCL1 Q07820 4/20 0.35
▸ ABCB1 P08183 1/20 0.34
▸ KDM4E B2RXH2 5/20 0.34
▸ ALDH1A1 P00352 3/20 0.34
▸ CYP3A4 P08684 2/20 0.34
▸ MAPT P10636 1/20 0.34
▸ PDE4D Q08499 4/20 0.33
▸ LMNA P02545 3/20 0.33
▸ HPGD P15428 2/20 0.32
▸ HSD17B10 Q99714 2/20 0.32
▸ GLA P06280 1/20 0.32
▸ GAA P10253 1/20 0.32
▸ MAPK1 P28482 1/20 0.32
▸ KMT2A Q03164 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006827 0.88 MCL1 (0.35) CA9CA12CA1CA2CA7
SCHEMBL9006636 0.88 CA9 (0.41) CA9CA12CA1CA2CA7
SCHEMBL9006756 0.84 MCL1 (0.40) CA9CA12CA1CA2CA7
SCHEMBL9006576 0.78 MET (0.41) CA9CA12CA1CA2CA7
SCHEMBL9006696 0.77 CA9 (0.33) CA9CA12CA1CA2CA7
SCHEMBL9006779 0.73 CYP2A6 (0.59) CA9CA12CA1CA2CA7
SCHEMBL9006534 0.71 MCL1 (0.32) CA9CA12CA1CA2CA7
SCHEMBL10931495 0.71 MET (0.50) CA9CA12CA1CA7CA13
SCHEMBL9006469 0.70 CYP2A6 (0.59) CA9CA12CA1CA2CA7
SCHEMBL2497907 0.64 ALDH1A1 (0.46) KDM4EALDH1A1CYP3A4MAPTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 — — US claimed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 — — EP claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 — — US claimed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 — — WO claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 — — US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 — — EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 — — US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 — — WO disclosed
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