SCHEMBL9008779

SCHEMBL9008779

C=C(C)C(=O)OCCOC1CC(C)(C)N(C)C(C)(C)C1

nearest known ligand 0.42

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.42
TSHR P16473 3/20 0.38
ALDH1A1 P00352 1/20 0.37
CA1 P00915 3/20 0.34
CA2 P00918 3/20 0.34
POLB P06746 1/20 0.31
APEX1 P27695 1/20 0.31
HTT P42858 1/20 0.31
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19594493 0.82 THRB (0.44) THRBTSHRALDH1A1CA1CA2
SCHEMBL12695595 0.82 THRB (0.44) THRBTSHRALDH1A1CA1CA2
SCHEMBL14885808 0.82 THRB (0.38) THRBTSHRALDH1A1CA1CA2
SCHEMBL67638 0.81 TSHR (0.39) TSHRALDH1A1HTT
SCHEMBL8854706 0.81 TSHR (0.39) TSHRALDH1A1HTT
SCHEMBL8385397 0.81 TSHR (0.41) TSHRALDH1A1
SCHEMBL17250051 0.81 THRB (0.44) THRBTSHRALDH1A1CA1CA2
SCHEMBL13567318 0.81 THRB (0.40) THRBTSHRALDH1A1CA1CA2
SCHEMBL69828 0.79 TSHR (0.43) THRBTSHRALDH1A1
SCHEMBL21890930 0.79 THRB (0.40) THRBTSHRALDH1A1CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9285521-B2 Photosensitive resin composition for color filter and uses thereof CHI MEI CORPORATION (TW) 2016-03-15 US disclosed
US-9268218-B2 Photosensitive resin composition for color filter and application thereof CHI MEI CORPORATION (TW) 2016-02-23 US disclosed
US-20150346405-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND USES THEREOF CHI MEI CORPORATION (TW) 2015-12-03 US disclosed
US-20150323863-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND APPLICATION THEREOF CHI MEI CORPORATION (TW) 2015-11-12 US disclosed
US-8158212-B2 Ink composition, inkjet recording method, and printed material FUJIFILM CORPORATION (JP) 2012-04-17 US disclosed
US-8053169-B2 an N-vinylcaptrolactam; a polymerization initiator; and organic amine compounds as light stabilizers; curing FUJIFILM CORPORATION (JP) 2011-11-08 US disclosed
US-20100075119-A1 INK COMPOSITION, INKJET RECORDING METHOD, AND PRINTED MATERIAL FUJIFILM CORPORATION (JP) 2010-03-25 US disclosed
US-20080286484-A1 INK COMPOSITION, INKJET RECORDING METHOD, AND PRINTED MATERIAL FUJIFILM CORPORATION (JP) 2008-11-20 US disclosed
US-20080074480-A1 INK COMPOSITION, INKJET RECORDING METHOD, AND PRINTED MATERIAL FUJIFILM CORPORATION (JP) 2008-03-27 US disclosed
US-20080063981-A1 Ink composition, inkjet recording method, printed material, and process for producing lithographic printing plate FUJIFILM CORPORATION (JP) 2008-03-13 US disclosed
EP-0495130-B1 NOVEL FLUORORESIN AND COATING MATERIAL BASED THEREON ASAHI CHEMICAL IND (JP) 1996-10-30 EP disclosed
US-5283304-A Gloss, hardness, weatherability; room temperature vulcanization ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1994-02-01 US disclosed
EP-0495130-A1 NOVEL FLUORORESIN AND COATING MATERIAL BASED THEREON Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1992-07-22 EP disclosed