Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FAAH | O00519 | 5/20 | 0.46 |
| ▸ | CA2 | P00918 | 5/20 | 0.42 |
| ▸ | ENPP2 | Q13822 | 3/20 | 0.40 |
| ▸ | CES1 | P23141 | 5/20 | 0.39 |
| ▸ | CES2 | O00748 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3367410 | 1.00 | FAAH (0.46) | FAAHCA2ENPP2CES1CES2 | |
| SCHEMBL6931623 | 1.00 | FAAH (0.46) | FAAHCA2ENPP2CES1CES2 | |
| SCHEMBL6931423 | 1.00 | FAAH (0.46) | FAAHCA2ENPP2CES1CES2 | |
| SCHEMBL6929986 | 1.00 | FAAH (0.46) | FAAHCA2ENPP2CES1CES2 | |
| SCHEMBL6932972 | 1.00 | FAAH (0.46) | FAAHCA2ENPP2CES1CES2 | |
| SCHEMBL66144 | 0.98 | FAAH (0.43) | FAAHCA2ENPP2CES1CES2 | |
| SCHEMBL64899 | 0.91 | HTT (0.43) | FAAHCA2ENPP2 | |
| SCHEMBL63956 | 0.84 | MEN1 (0.38) | FAAH | |
| SCHEMBL23923246 | 0.79 | TDP1 (0.40) | — | |
| SCHEMBL23923247 | 0.79 | TDP1 (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0417557-B1 | Positive-working radiation-sensitive mixture and recording material prepared therefrom | HOECHST AG (DE) | 1996-12-11 | — | — | EP | disclosed |
| EP-0444493-B1 | Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom | HOECHST AG (DE) | 1996-11-20 | — | — | EP | disclosed |
| US-5424166-A | Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-06-13 | — | — | US | disclosed |
| US-5338641-A | Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α,α-bis(sulfonyl) diazo methane as an acid forming compound | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-08-16 | — | — | US | disclosed |
| EP-0444493-A2 | Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-09-04 | — | — | EP | disclosed |
| EP-0417557-A2 | Positive-working radiation-sensitive mixture and recording material prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-03-20 | — | — | EP | disclosed |