SCHEMBL9011744

SCHEMBL9011744

[SiH3]c1ccccc1C1CCCC1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGDR2 Q9Y5Y4 1/20 0.47
HTR1D P28221 2/20 0.39
HTR1B P28222 2/20 0.39
PTGS2 P35354 1/20 0.39
HTR2C P28335 2/20 0.36
PDPK1 O15530 1/20 0.36
SLC18A3 Q16572 1/20 0.36
HTR1A P08908 2/20 0.36
USP2 O75604 1/20 0.36
CYP1A2 P05177 1/20 0.36
ADRA2A P08913 1/20 0.36
CYP2D6 P10635 1/20 0.36
CHRM1 P11229 1/20 0.36
CYP2C9 P11712 1/20 0.36
DRD1 P21728 1/20 0.36
TBXA2R P21731 1/20 0.36
PTGS1 P23219 1/20 0.36
SLC6A2 P23975 1/20 0.36
SLC6A4 P31645 1/20 0.36
ADRA1A P35348 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9011807 0.98 PTGDR2 (0.50) PTGDR2HTR1DHTR1BPTGS2HTR2C
SCHEMBL28957753 0.90 HTR2C (0.39) PTGDR2HTR2CPDPK1HTR1ACYP1A2
SCHEMBL779938 0.82 CHRNB4 (0.46) PTGDR2HTR1DHTR1BPTGS2HTR2C
SCHEMBL15914935 0.80 PTGDR2 (0.40) PTGDR2HTR1DHTR1BPTGS2HTR2C
SCHEMBL42781 0.79 PTGDR2 (0.48) PTGDR2HTR1DHTR1BPTGS2HTR2C
SCHEMBL15915330 0.79 PTGDR2 (0.42) PTGDR2HTR1DHTR1BPTGS2HTR1A
Hydrogen Peroxide SCHEMBL3679819 0.75 PTGDR2 (0.55) PTGDR2PTGS2SLC18A3BCHEACHE
Hydrogen Peroxide SCHEMBL11398422 0.75 PTGDR2 (0.55) PTGDR2PTGS2SLC18A3BCHEACHE
SCHEMBL2913620 0.74 CHRNB4 (0.44) PTGDR2PTGS2HTR2CPDPK1
SCHEMBL4476575 0.73 PTGS2 (0.56) PTGDR2PTGS2CYP1A2CYP2D6BCHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9970103-B2 Film deposition material, sealing film using the same and use thereof TOSOH CORPORATION (JP) 2018-05-15 US disclosed
US-20160326642-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2016-11-10 US disclosed
US-20140219903-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2014-08-07 US disclosed
EP-0534700-B1 Process for cycloalkyl substitution of hydrogen containing silanes DOW CORNING (US) 1996-11-20 EP disclosed
EP-0534700-A1 Process for cycloalkyl substitution of hydrogen containing silanes DOW CORNING CORPORATION (US) 1993-03-31 EP disclosed
US-5118829-A Organoborane compound catalyst DOW CORNING CORPORATION (US) 1992-06-02 US disclosed