SCHEMBL15914935

SCHEMBL15914935

[SiH3]c1cccc(C2CCCC2)c1C1CCCC1

nearest known ligand 0.40

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
PTGDR2 Q9Y5Y4 2/20 0.40
HTR1A P08908 1/20 0.36
HTR7 P34969 1/20 0.36
CEL P19835 2/20 0.35
ABCB1 P08183 2/20 0.35
PDCD1 Q15116 1/20 0.34
CD274 Q9NZQ7 1/20 0.34
HTR1D P28221 2/20 0.33
HTR1B P28222 2/20 0.33
KMO O15229 1/20 0.33
PTGS2 P35354 1/20 0.33
HTR2C P28335 1/20 0.32
PTGDR Q13258 1/20 0.31
PDK2 Q15119 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15915330 0.98 PTGDR2 (0.42) PTGDR2HTR1AHTR7CELABCB1
SCHEMBL15914889 0.85 CEL (0.36) PTGDR2HTR1AHTR7CELABCB1
SCHEMBL777873 0.84 CEL (0.41) PTGDR2HTR1AHTR7CELABCB1
SCHEMBL15915046 0.83 CEL (0.38) PTGDR2CELABCB1KMOPTGDR
SCHEMBL239469 0.82 ABCB1 (0.43) PTGDR2HTR1AHTR7CELABCB1
SCHEMBL14353365 0.80 ABCB1 (0.42) PTGDR2HTR1AHTR7CELABCB1
SCHEMBL9011744 0.80 PTGDR2 (0.47) PTGDR2HTR1AHTR7CELHTR1D
SCHEMBL9011807 0.78 PTGDR2 (0.50) PTGDR2CELPDCD1CD274HTR1D
SCHEMBL620017 0.78 TDO2 (0.39) PTGDR2HTR1AHTR7CELABCB1
SCHEMBL4647449 0.75 PTGS2 (0.39) PTGDR2HTR1AHTR7CELABCB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118852230-A Preparation method of polysubstituted hydrosilane compound 中国科学院兰州化学物理研究所 2024-10-29 CN disclosed
US-9970103-B2 Film deposition material, sealing film using the same and use thereof TOSOH CORPORATION (JP) 2018-05-15 US disclosed
US-20160326642-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2016-11-10 US disclosed
US-20140219903-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2014-08-07 US disclosed