SCHEMBL9011807

SCHEMBL9011807

[SiH3]c1ccccc1C1CCCCC1

nearest known ligand 0.50

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
PTGDR2 Q9Y5Y4 1/20 0.50
PTGS2 P35354 1/20 0.41
BCHE P06276 1/20 0.38
ACHE P22303 1/20 0.38
HTR1D P28221 2/20 0.38
HTR1B P28222 2/20 0.38
CEL P19835 1/20 0.36
EPHX1 P07099 1/20 0.36
PDCD1 Q15116 1/20 0.36
CD274 Q9NZQ7 1/20 0.36
PDPK1 O15530 1/20 0.35
HTR2C P28335 1/20 0.35
CYP11B2 P19099 1/20 0.35
NOS1 P29475 1/20 0.35
PTPRC P08575 1/20 0.35
PTPRF P10586 1/20 0.35
PTPN1 P18031 1/20 0.35
CDC25B P30305 1/20 0.35
SLC18A3 Q16572 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9011744 0.98 PTGDR2 (0.47) PTGDR2PTGS2BCHEACHEHTR1D
SCHEMBL28957753 0.88 HTR2C (0.39) PTGDR2PDPK1HTR2C
SCHEMBL42781 0.83 PTGDR2 (0.48) PTGDR2PTGS2BCHEACHEHTR1D
SCHEMBL15915330 0.81 PTGDR2 (0.42) PTGDR2PTGS2HTR1DHTR1BCEL
SCHEMBL779938 0.80 CHRNB4 (0.46) PTGDR2PTGS2BCHEACHEHTR1D
SCHEMBL15914935 0.78 PTGDR2 (0.40) PTGDR2PTGS2HTR1DHTR1BCEL
Hydrogen Peroxide SCHEMBL3679819 0.78 PTGDR2 (0.55) PTGDR2PTGS2BCHEACHECEL
Hydrogen Peroxide SCHEMBL11398422 0.78 PTGDR2 (0.55) PTGDR2PTGS2BCHEACHECEL
SCHEMBL4476575 0.76 PTGS2 (0.56) PTGDR2PTGS2BCHEACHEPTPRC
SCHEMBL28904978 0.76 PTGDR2 (0.44) PTGDR2PTGS2BCHEACHEHTR1D

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118852230-A Preparation method of polysubstituted hydrosilane compound 中国科学院兰州化学物理研究所 2024-10-29 CN disclosed
CN-114207901-A Nonaqueous electrolyte solution and nonaqueous electrolyte battery 三菱化学株式会社 2022-03-18 CN disclosed
US-9970103-B2 Film deposition material, sealing film using the same and use thereof TOSOH CORPORATION (JP) 2018-05-15 US disclosed
US-20160326642-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2016-11-10 US disclosed
US-20140219903-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2014-08-07 US disclosed
EP-0534700-B1 Process for cycloalkyl substitution of hydrogen containing silanes DOW CORNING (US) 1996-11-20 EP disclosed
EP-0534700-A1 Process for cycloalkyl substitution of hydrogen containing silanes DOW CORNING CORPORATION (US) 1993-03-31 EP disclosed
US-5118829-A Organoborane compound catalyst DOW CORNING CORPORATION (US) 1992-06-02 US disclosed