SCHEMBL9013702

SCHEMBL9013702

CC1(c2ccccc2)N=CC=N1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.38
ALDH1A1 P00352 2/20 0.38
GAA P10253 2/20 0.38
MCL1 Q07820 2/20 0.38
PAX8 Q06710 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
MMP2 P08253 1/20 0.37
MMP9 P14780 1/20 0.37
OPRM1 P35372 1/20 0.36
OPRK1 P41145 1/20 0.36
OPRL1 P41146 1/20 0.36
BACE1 P56817 4/20 0.33
POLB P06746 2/20 0.31
GPR55 Q9Y2T6 1/20 0.31
MEN1 O00255 2/20 0.31
KMT2A Q03164 2/20 0.31
KDM4E B2RXH2 1/20 0.31
MAPT P10636 1/20 0.31
THRB P10828 1/20 0.31
MPI P34949 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL2461990 0.97 ALDH1A1 (0.37) LMNAALDH1A1GAAMCL1PAX8
SCHEMBL2595557 0.78 LMNA (0.41) LMNAALDH1A1GAAMCL1PAX8
SCHEMBL18788061 0.75 TSHR (0.37) LMNAGAAMCL1MMP2MMP9
SCHEMBL5276695 0.74 ALDH1A1 (0.38) LMNAALDH1A1GAAMCL1PAX8
SCHEMBL28811879 0.72 CA1 (0.48) ALDH1A1GAAL3MBTL1OPRM1OPRL1
SCHEMBL28430320 0.70 BACE1 (0.33) LMNAALDH1A1GAAMCL1PAX8
SCHEMBL29038498 0.69 SLC6A2 (0.38) ALDH1A1BACE1GPR55MEN1KMT2A
SCHEMBL1067618 0.68 OPRL1 (0.33) ALDH1A1GAAOPRM1OPRK1OPRL1
SCHEMBL28811963 0.68 ALDH1A1 (0.33) LMNAALDH1A1GAAMCL1PAX8
SCHEMBL9034778 0.67 ALDH1A1 (0.38) LMNAALDH1A1GAAMCL1PAX8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-4164918-A None JP disclosed
WO-2024224984-A1 COMPOSITE RESIN AND METHOD FOR PRODUCING SAME DIC株式会社 2024-10-31 WO disclosed
WO-2024224983-A1 COMPOSITION, NEGATIVE ELECTRODE ACTIVE MATERIAL, METHOD FOR MANUFACTURING NEGATIVE ELECTRODE ACTIVE MATERIAL, AND SECONDARY BATTERY DIC株式会社 2024-10-31 WO disclosed
CN-114555660-B Nitrile group-containing copolymer rubber 日本瑞翁株式会社 2024-06-11 CN disclosed
CN-107488259-B Epoxy resin composition comprising AM-CPDA as curing agent 赢创运营有限公司 2021-08-03 CN disclosed
CN-111918931-A Resin sheet and method for producing same 琳得科株式会社 2020-11-10 CN disclosed
CN-110997765-A Resin sheet 琳得科株式会社 2020-04-10 CN disclosed
EP-0448862-B1 Particulate spacers and a method for producing the same, and a method for producing a liquid crystal display cell by using the particulate spacers SEKISUI FINE CHEMICAL CO LTD (JP) 1996-12-11 EP disclosed
US-5130831-A Particulate spacers and liquid crystal display cells containing these spacers SEKISUI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1992-07-14 US disclosed
JP-H04164918-A RESIN COMPOSITION, RESIN COMPOSITION FOR FILM FOR PROTECTING COLOR FILTER, AND THEIR CURED PRODUCTS NIPPON KAYAKU CO LTD 1992-06-10 JP disclosed
EP-0448862-A2 Particulate spacers and a method for producing the same, and a method for producing a liquid crystal display cell by using the particulate spacers SEKISUI FINE CHEMICAL CO., LTD. (JP) 1991-10-02 EP disclosed