SCHEMBL90443

SCHEMBL90443

[SiH3]N1CCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7149124 0.84
SCHEMBL12236593 0.78
SCHEMBL898958 0.72
SCHEMBL380486 0.61 FDPS (0.33)
SCHEMBL9482471 0.57
SCHEMBL78337 0.56 MGLL (0.33)
SCHEMBL515359 0.56 MGLL (0.33)
SCHEMBL514846 0.56 MGLL (0.33)
SCHEMBL6926105 0.53 MGLL (0.40)
SCHEMBL42220 0.53 MGLL (0.40)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110573652-B Novel formulations for depositing silicon doped hafnium oxide as ferroelectric material 弗萨姆材料美国有限责任公司 2022-07-22 CN claimed
US-20130022745-A1 SILANE BLEND FOR THIN FILM VAPOR DEPOSITION AMERICAN AIR LIQUIDE, INC. (US) 2013-01-24 US claimed
WO-2011020028-A2 SILANE BLEND FOR THIN FILM VAPOR DEPOSITION L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2011-02-17 WO claimed
JP-2010539730-A 2010-12-16 JP claimed
CN-101889331-A Method of forming silicon-containing films AIR LIQUIDE 2010-11-17 CN claimed
EP-2193541-A1 METHOD OF FORMING SILICON-CONTAINING FILMS L'AIR LIQUIDE, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) 2010-06-09 EP claimed
WO-2009039251-A1 METHOD OF FORMING SILICON-CONTAINING FILMS L'AIR LIQUIDE - SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2009-03-26 WO claimed
US-20090075490-A1 METHOD OF FORMING SILICON-CONTAINING FILMS L'AIR LIQUITE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2009-03-19 US claimed
CN-1083938-A Photoresist composition and application said composition produce the method for figure SAMSUNG ELECTRONICS CO LTD (KR) 1994-03-16 CN claimed
JP-1056769-A None JP disclosed
CN-117940603-A Silicon precursor compound, silicon-containing film-forming composition comprising the same, and method for forming film using the silicon-containing film-forming composition UP化学株式会社 2024-04-26 CN disclosed
CN-117642525-A Silicon precursor compound, composition for forming silicon-containing film comprising the same, and method for forming film using composition for forming silicon-containing film UP化学株式会社 2024-03-01 CN disclosed
EP-3273966-B1 INHIBITORS OF CYCLIN-DEPENDENT KINASES DANA FARBER CANCER INST INC (US) 2023-05-03 EP disclosed
CN-110573652-B Novel formulations for depositing silicon doped hafnium oxide as ferroelectric material 弗萨姆材料美国有限责任公司 2022-07-22 CN disclosed
WO-1997008216-A1 METHOD FOR PRODUCING DIENE-MODIFIED PROPYLENE POLYMER EXXON CHEMICAL PATENTS INC. (US) 1997-03-06 WO disclosed
CN-1083938-A Photoresist composition and application said composition produce the method for figure SAMSUNG ELECTRONICS CO LTD (KR) 1994-03-16 CN disclosed
EP-0295401-A2 Process for polymerizing polar compounds WACKER-CHEMIE GMBH (DE) 1988-12-21 EP disclosed
EP-0112434-B1 HYDROGEN BEARING SILYL CARBAMATES UNION CARBIDE CORPORATION (US) 1988-08-17 EP disclosed
EP-0112434-A2 Hydrogen bearing silyl carbamates UNION CARBIDE CORPORATION (US) 1984-07-04 EP disclosed
US-4400526-A Hydrogen bearing silyl carbamates UNION CARBIDE CORPORATION (US) 1983-08-23 US disclosed