Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMPD1 | P17405 | 3/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | DNM1 | Q05193 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | ADH1B | P00325 | 1/20 | 0.35 |
| ▸ | ADH1C | P00326 | 1/20 | 0.35 |
| ▸ | ADH1A | P07327 | 1/20 | 0.35 |
| ▸ | ADH4 | P08319 | 1/20 | 0.35 |
| ▸ | ADH7 | P40394 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.34 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.34 |
| ▸ | DDAH1 | O94760 | 1/20 | 0.34 |
| ▸ | GAPDH | P04406 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | GPR84 | Q9NQS5 | 2/20 | 0.33 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.33 |
| ▸ | FDPS | P14324 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11826822 | 0.86 | MEN1 (0.42) | SMPD1LMNAMEN1KMT2ATRPA1 | |
| SCHEMBL13639178 | 0.85 | ADH1B (0.38) | SMPD1LMNADNM1MEN1KMT2A | |
| SCHEMBL19465532 | 0.81 | LMNA (0.35) | SMPD1LMNADNM1MEN1KMT2A | |
| SCHEMBL19465531 | 0.81 | LMNA (0.35) | SMPD1LMNADNM1MEN1KMT2A | |
| SCHEMBL1483634 | 0.79 | MEN1 (0.47) | LMNAMEN1KMT2ATHRBMAPT | |
| SCHEMBL17107446 | 0.78 | MEN1 (0.36) | SMPD1LMNADNM1MEN1KMT2A | |
| SCHEMBL251783 | 0.78 | LMNA (0.42) | SMPD1LMNAMEN1KMT2ATHRB | |
| SCHEMBL12611389 | 0.78 | MEN1 (0.46) | LMNAMEN1KMT2ATHRBMAPT | |
| SCHEMBL3034864 | 0.78 | TRPA1 (0.39) | SMPD1MEN1KMT2AADH1BADH1C | |
| SCHEMBL3039522 | 0.78 | TRPA1 (0.39) | SMPD1MEN1KMT2AADH1BADH1C |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2689450-A1 | FUNCTIONAL LIQUID EJECTION APPARATUS, FUNCTIONAL LIQUID EJECTION METHOD AND IMPRINTING SYSTEM | FUJIFILM Corporation (JP) | 2014-01-29 | — | — | EP | disclosed |
| EP-2556532-A1 | CURABLE COMPOSITION FOR IMPRINTS AND PRODUCING METHOD OF POLYMERIZABLE MONOMER FOR IMPRINTS | FUJIFILM Corporation (JP) | 2013-02-13 | — | — | EP | disclosed |
| EP-2553713-A1 | NANOIMPRINTING METHOD AND METHOD FOR PRODUCING A MOLD | FUJIFILM Corporation (JP) | 2013-02-06 | — | — | EP | disclosed |
| WO-2012133728-A1 | FUNCTIONAL LIQUID EJECTION APPARATUS, FUNCTIONAL LIQUID EJECTION METHOD AND IMPRINTING SYSTEM | FUJIFILM CORPORATION (JP) | 2012-10-04 | — | — | WO | disclosed |
| EP-2499659-A1 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM Corporation (JP) | 2012-09-19 | — | — | EP | disclosed |
| WO-2012002556-A1 | LIQUID APPLICATION DEVICE, LIQUID APPLICATION METHOD, AND NANOIMPRINT SYSTEM | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | WO | disclosed |
| WO-2011126101-A1 | CURABLE COMPOSITION FOR IMPRINTS AND PRODUCING METHOD OF POLYMERIZABLE MONOMER FOR IMPRINTS | FUJIFILM CORPORATION (JP) | 2011-10-13 | — | — | WO | disclosed |
| WO-2011126131-A1 | PATTERN FORMING METHOD AND PROCESS FOR PRODUCING PATTERN SUBSTRATES | FUJIFILM CORPORATION (JP) | 2011-10-13 | — | — | WO | disclosed |
| WO-2011122704-A1 | NANOIMPRINTING METHOD AND METHOD FOR PRODUCING A MOLD | FUJIFILM CORPORATION (JP) | 2011-10-06 | — | — | WO | disclosed |
| EP-2352768-A2 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM Corporation (JP) | 2011-08-10 | — | — | EP | disclosed |
| EP-2342243-A1 | COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD | FUJIFILM Corporation (JP) | 2011-07-13 | — | — | EP | disclosed |
| WO-2011059104-A1 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2011-05-19 | — | — | WO | disclosed |
| WO-2011040635-A1 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2011-04-07 | — | — | WO | disclosed |
| EP-2268680-A1 | CURABLE COMPOSITION FOR IMPRINT,PATTERNING METHOD AND PATTERN | FUJIFILM Corporation (JP) | 2011-01-05 | — | — | EP | disclosed |
| WO-2010104188-A1 | CURABLE COMPOSITION FOR IMPRINT,PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2010-09-16 | — | — | WO | disclosed |
| WO-2010064726-A2 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2010-06-10 | — | — | WO | disclosed |
| WO-2010050614-A1 | COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD | FUJIFILM CORPORATION (JP) | 2010-05-06 | — | — | WO | disclosed |