Known targets — ChEMBL curated mechanism
ABL1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB2AGTR1BCL2BCL2A1BCL2L1BCL2L10BCL2L2BCRBRAFCHRM1CHRNA10CHRNA9DRD1DRD2DRD3DRD4DRD5EGFRF2FLT1FLT4GCKGHSRGNRHRGRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BHTR1AHTR1BHTR1DHTR2AHTR2CHTR3AIDH2KDRKITMAOBMCL1MTTPPP4HBPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PIKFYVEROCK1ROCK2SLC18A2SLC6A2SLC6A3SLC6A4TACR1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8gyrAgyrBparCparEpol
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11351756 | 0.90 | — | — | |
| SCHEMBL25599 | 0.89 | CA2 (0.58) | — | |
| SCHEMBL8596055 | 0.89 | CA2 (0.58) | — | |
| SCHEMBL105 | 0.89 | — | — | |
| SCHEMBL15109974 | 0.89 | — | — | |
| SCHEMBL128169 | 0.89 | — | — | |
| SCHEMBL246838 | 0.89 | CA2 (0.58) | — | |
| Phosphine SCHEMBL1052219 | 0.84 | — | — | |
| SCHEMBL20570028 | 0.84 | — | — | |
| SCHEMBL8541710 | 0.84 | CA2 (0.54) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2278399-B1 | Positive-working resist composition | FUJIFILM CORP (JP) | 2013-05-15 | — | — | EP | disclosed |
| US-RE43560-E1 | Positive photosensitive compositions | FUJIFILM CORPORATION (JP) | 2012-07-31 | — | — | US | disclosed |
| EP-2477073-A1 | Resist composition for electron beam, EUV or X-ray | Fujifilm Corporation (JP) | 2012-07-18 | — | — | EP | disclosed |
| EP-1367440-B1 | Positive-working resist composition | FUJIFILM CORP (JP) | 2011-09-21 | — | — | EP | disclosed |
| EP-2278398-A2 | Positive-working resist composition | Fujifilm Corporation (JP) | 2011-01-26 | — | — | EP | disclosed |
| EP-2278397-A2 | Positive-working resist composition | Fujifilm Corporation (JP) | 2011-01-26 | — | — | EP | disclosed |
| EP-2278400-A2 | Positive-working resist composition | Fujifilm Corporation (JP) | 2011-01-26 | — | — | EP | disclosed |
| EP-2278399-A2 | Positive-working resist composition | Fujifilm Corporation (JP) | 2011-01-26 | — | — | EP | disclosed |
| EP-1467251-B1 | Positive resist composition | FUJIFILM CORP (JP) | 2010-09-08 | — | — | EP | disclosed |
| EP-1117002-B1 | Negative-working resist composition | FUJIFILM CORP (JP) | 2010-04-14 | — | — | EP | disclosed |
| US-20020061462-A1 | Negative resist composition | FUJI PHOTO FILM CO., LTD. | 2002-05-23 | — | — | US | disclosed |
| US-20020058200-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2002-05-16 | — | — | US | disclosed |
| EP-1193555-A1 | Negative resist composition | Fuji Photo Film Co., Ltd. (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-20010041300-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2001-11-15 | — | — | US | disclosed |
| US-20010036590-A1 | Chemical amplification type negative-working resist composition for electron beams or X-rays | FUJIFILM CORPORATION (JP) | 2001-11-01 | — | — | US | disclosed |
| US-6265135-B1 | ARYL SULFONIUM OR IODONIUM COMPOUND WHICH GENERATES BENZENE-, NAPHTHALENE- OR ANTHRACENESULFONIC ACID WHICH IS SUBSTITUTED BY AT LEAST ONE FLUORINE ATOM AND/OR AT LEAST ONE GROUP CONTAINING A FLUORINE ATOM. | FUJI PHOTO FILM CO., LTD. (JP) | 2001-07-24 | — | — | US | disclosed |
| EP-1117004-A2 | Electron beam or x-ray negative-working resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2001-07-18 | — | — | EP | disclosed |
| EP-1117002-A1 | Negative-working resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2001-07-18 | — | — | EP | disclosed |
| EP-1109066-A1 | Chemical amplification type negative-working resist composition for electron beams or x-rays | FUJI PHOTO FILM CO., LTD. (JP) | 2001-06-20 | — | — | EP | disclosed |
| EP-1076261-A1 | Negative resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2001-02-14 | — | — | EP | disclosed |