SCHEMBL906499

SCHEMBL906499

C=C(OC(C)=O)C(=O)OCC(F)(F)C(F)(F)F

nearest known ligand 0.35

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
ALDH1A1 P00352 1/20 0.31
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL906567 0.85 HTT (0.41) HSD17B10TDP1ALDH1A1TSHR
SCHEMBL36589 0.81 TSHR (0.45) TDP1ALDH1A1TSHR
SCHEMBL906207 0.80 ALDH1A1 (0.36) HSD17B10ALDH1A1TSHR
SCHEMBL906414 0.78
SCHEMBL2527318 0.77 HTT (0.32)
SCHEMBL14281229 0.77 HTT (0.32)
SCHEMBL16708640 0.76 THRB (0.38) HSD17B10TDP1ALDH1A1TSHR
SCHEMBL5356743 0.76 ALDH1A1 (0.42) HSD17B10TDP1ALDH1A1TSHR
SCHEMBL17603228 0.75 TSHR (0.40) ALDH1A1TSHR
SCHEMBL21219459 0.75 ALDH1A1 (0.54) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9182674-B2 Immersion upper layer film forming composition and method of forming photoresist pattern JSR CORPORATION (JP) 2015-11-10 US disclosed
EP-2468780-B1 Copolymer and top coating composition JSR CORP (JP) 2013-11-13 EP disclosed
US-8580482-B2 Copolymer and top coating composition JSR CORPORATION (JP) 2013-11-12 US disclosed
EP-1806370-B1 COPOLYMER AND UPPER FILM-FORMING COMPOSITION JSR CORP (JP) 2013-05-22 EP disclosed
EP-2277929-B1 Copolymer and top coating composition JSR CORP (JP) 2012-11-21 EP disclosed
US-20120282553-A1 IMMERSION UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN JSR CORPORATION (JP) 2012-11-08 US disclosed
EP-2315078-B1 Upper layer film forming composition for liquid immersion and method of forming photoresist pattern JSR CORP (JP) 2012-10-17 EP disclosed
EP-2468780-A1 Copolymer and top coating composition JSR Corporation (JP) 2012-06-27 EP disclosed
US-20120101205-A1 COPOLYMER AND TOP COATING COMPOSITION JSR CORPORATION (JP) 2012-04-26 US disclosed
EP-1818723-B1 COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN JSR CORP (JP) 2011-05-04 EP disclosed
EP-2277929-A1 Copolymer and top coating composition JSR Corporation (JP) 2011-01-26 EP disclosed
US-20100266953-A1 COPOLYMER AND TOP COATING COMPOSITION JSR CORPORATION (JP) 2010-10-21 US disclosed
US-7781142-B2 Copolymer and top coating composition JSR CORPORATION (JP) 2010-08-24 US disclosed
US-7709182-B2 Composition for forming antireflection film, layered product, and method of forming resist pattern JSR CORPORATION (JP) 2010-05-04 US disclosed
US-20080124524-A1 Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern JSR CORPORATION (JP) 2008-05-29 US disclosed
US-20080038661-A1 Copolymer and Top Coating Composition JSR CORPORATION (JP) 2008-02-14 US disclosed
US-20070269734-A1 Uper Layer Film Forming Composition for Liquid Immersion and Method of Forming Photoresist Pattern JSR CORPORATION (JP) 2007-11-22 US disclosed
EP-1818723-A1 COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN JSR Corporation (JP) 2007-08-15 EP disclosed
EP-1806370-A1 COPOLYMER AND UPPER FILM-FORMING COMPOSITION JSR Corporation (JP) 2007-07-11 EP disclosed
EP-1708027-A1 UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN JSR Corporation (JP) 2006-10-04 EP disclosed