Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 2/20 | 0.31 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.31 |
| ▸ | MGAM | O43451 | 1/20 | 0.31 |
| ▸ | SI | P14410 | 1/20 | 0.31 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.31 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL906346 | 0.85 | HTT (0.42) | ALDH1A1TSHRLMNAHSD17B10THRB | |
| SCHEMBL906499 | 0.80 | HSD17B10 (0.35) | ALDH1A1TSHRHSD17B10 | |
| SCHEMBL906414 | 0.79 | — | — | |
| SCHEMBL36589 | 0.79 | TSHR (0.45) | ALDH1A1TSHRTHRB | |
| SCHEMBL2527318 | 0.78 | HTT (0.32) | — | |
| SCHEMBL94679 | 0.77 | ALDH1A1 (0.54) | ALDH1A1TSHRLMNAHSD17B10THRB | |
| SCHEMBL2519772 | 0.77 | THRB (0.40) | ALDH1A1TSHRLMNAHSD17B10THRB | |
| SCHEMBL28338310 | 0.77 | ALDH1A1 (0.42) | ALDH1A1TSHRLMNAHSD17B10THRB | |
| SCHEMBL20749530 | 0.76 | ALDH1A1 (0.56) | ALDH1A1TSHRLMNAHSD17B10THRB | |
| SCHEMBL26754169 | 0.76 | TET2 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1708027-B1 | UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORP (JP) | 2019-03-13 | — | — | EP | disclosed |
| US-9182674-B2 | Immersion upper layer film forming composition and method of forming photoresist pattern | JSR CORPORATION (JP) | 2015-11-10 | — | — | US | disclosed |
| EP-2468780-B1 | Copolymer and top coating composition | JSR CORP (JP) | 2013-11-13 | — | — | EP | disclosed |
| US-8580482-B2 | Copolymer and top coating composition | JSR CORPORATION (JP) | 2013-11-12 | — | — | US | disclosed |
| EP-1806370-B1 | COPOLYMER AND UPPER FILM-FORMING COMPOSITION | JSR CORP (JP) | 2013-05-22 | — | — | EP | disclosed |
| EP-2277929-B1 | Copolymer and top coating composition | JSR CORP (JP) | 2012-11-21 | — | — | EP | disclosed |
| US-20120282553-A1 | IMMERSION UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2012-11-08 | — | — | US | disclosed |
| EP-2315078-B1 | Upper layer film forming composition for liquid immersion and method of forming photoresist pattern | JSR CORP (JP) | 2012-10-17 | — | — | EP | disclosed |
| EP-2468780-A1 | Copolymer and top coating composition | JSR Corporation (JP) | 2012-06-27 | — | — | EP | disclosed |
| US-20120101205-A1 | COPOLYMER AND TOP COATING COMPOSITION | JSR CORPORATION (JP) | 2012-04-26 | — | — | US | disclosed |
| US-7709182-B2 | Composition for forming antireflection film, layered product, and method of forming resist pattern | JSR CORPORATION (JP) | 2010-05-04 | — | — | US | disclosed |
| US-20080124524-A1 | Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern | JSR CORPORATION (JP) | 2008-05-29 | — | — | US | disclosed |
| US-20080038661-A1 | Copolymer and Top Coating Composition | JSR CORPORATION (JP) | 2008-02-14 | — | — | US | disclosed |
| US-20070269734-A1 | Uper Layer Film Forming Composition for Liquid Immersion and Method of Forming Photoresist Pattern | JSR CORPORATION (JP) | 2007-11-22 | — | — | US | disclosed |
| EP-1818723-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR Corporation (JP) | 2007-08-15 | — | — | EP | disclosed |
| EP-1806370-A1 | COPOLYMER AND UPPER FILM-FORMING COMPOSITION | JSR Corporation (JP) | 2007-07-11 | — | — | EP | disclosed |
| EP-1708027-A1 | UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR Corporation (JP) | 2006-10-04 | — | — | EP | disclosed |
| EP-0583918-B1 | Reflection preventing film and process for forming resist pattern using the same | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1999-03-10 | — | — | EP | disclosed |
| US-5410005-A | Comprising acrylic amide and ester copolymers and their salts, having carboxyl and sulfonic acid groups as well as fluoro | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-04-25 | — | — | US | disclosed |
| EP-0583918-A2 | Reflection preventing film and process for forming resist pattern using the same | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-02-23 | — | — | EP | disclosed |