SCHEMBL9066558

SCHEMBL9066558

C=CC(=O)Oc1cc(Cl)c(Cl)c(Cl)c1Cl

nearest known ligand 0.38

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
AKR1B1 P15121 1/20 0.38
CYP3A4 P08684 2/20 0.36
THRB P10828 3/20 0.35
THRA P10827 1/20 0.35
TSHR P16473 3/20 0.34
HPGD P15428 3/20 0.34
HSD17B10 Q99714 3/20 0.34
EGFR P00533 2/20 0.34
HSP90AA1 P07900 1/20 0.34
KMT2A Q03164 1/20 0.33
TYMS P04818 1/20 0.33
GAA P10253 1/20 0.31
MAPK1 P28482 1/20 0.30
KDM4E B2RXH2 1/20 0.30
MAPT P10636 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18889460 0.88 KMT2A (0.36) AKR1B1THRBTHRATSHREGFR
SCHEMBL18154469 0.84 THRB (0.38) THRBTHRATSHRHPGDEGFR
SCHEMBL1153847 0.81 FABP3 (0.43) CYP3A4THRBTHRATSHRHPGD
SCHEMBL30596859 0.81 FABP3 (0.43) CYP3A4THRBTHRATSHRHPGD
SCHEMBL4906024 0.81 LMNA (0.41) THRBTHRATSHRHPGDHSD17B10
SCHEMBL9661725 0.79 KMT2A (0.38) AKR1B1CYP3A4TSHRHPGDHSD17B10
SCHEMBL11230910 0.78 AKR1B1 (0.45) AKR1B1CYP3A4TSHRHPGDHSD17B10
SCHEMBL11171012 0.78 CYP3A4 (0.36) AKR1B1CYP3A4THRBTSHRHPGD
SCHEMBL15169353 0.77 THRB (0.49) AKR1B1CYP3A4THRBTSHRHPGD
SCHEMBL28586693 0.75 EGFR (0.42) EGFRKMT2AGAAKDM4EMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109388024-B Photosensitive resin composition and method for producing the same, black matrix, pixel layer, protective film, color filter, and liquid crystal display device 奇美实业股份有限公司 2023-02-28 CN disclosed
CN-115542666-A Photosensitive resin composition for spacer and protective film 奇美实业股份有限公司 2022-12-30 CN disclosed
CN-107636038-B Reactive compositions containing mercapto-functional silicon compounds 莫门蒂夫性能材料股份有限公司 2020-09-22 CN disclosed
CN-107132729-B Photosensitive resin composition and application thereof 奇美实业股份有限公司 2020-08-14 CN disclosed
CN-106933033-B Photosensitive resin composition, optical filter and manufacturing method thereof, and liquid crystal display device 奇美实业股份有限公司 2020-03-13 CN disclosed
CN-107015435-B Photosensitive resin composition, color filter and manufacturing method and application thereof 奇美实业股份有限公司 2019-12-13 CN disclosed
US-9285521-B2 Photosensitive resin composition for color filter and uses thereof CHI MEI CORPORATION (TW) 2016-03-15 US disclosed
US-9274419-B2 Blue photosensitive resin composition for color filter and application thereof CHI MEI CORPORATION (TW) 2016-03-01 US disclosed
US-20150346405-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND USES THEREOF CHI MEI CORPORATION (TW) 2015-12-03 US disclosed
US-20150268554-A1 BLUE PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND APPLICATION THEREOF CHI MEI CORPORATION (TW) 2015-09-24 US disclosed
US-20150042931-A1 BLUE PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND USES THEREOF CHI MEI CORPORATION (TW) 2015-02-12 US disclosed
US-20140346416-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR A COLOR FILTER AND USES THEREOF CHI MEI CORPORATION (TW) 2014-11-27 US disclosed
US-20140343185-A1 RED PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND APPLICATION OF THE SAME CHI MEI CORPORATION (TW) 2014-11-20 US disclosed
US-20130228727-A1 PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION OF THE SAME CHI MEI CORPORATION (TW) 2013-09-05 US disclosed
US-20130222738-A1 COLOR LIQUID CRYSTAL DISPLAY DEVICE CHI MEI CORPORATION (TW) 2013-08-29 US disclosed
US-20130208215-A1 COLOR LIQUID CRYSTAL DISPLAY DEVICE CHI MEI CORPORATION (TW) 2013-08-15 US disclosed
EP-0483717-B1 Polymer blends KURARAY CO (JP) 1996-07-31 EP disclosed
US-5200492-A Copolymer of methyl methacrylate with halophenyl (meth)acrylate and aromatic polycarbonate KURARAY CO., LTD. (JP) 1993-04-06 US disclosed
US-5129031-A Heat resistance HOECHST AKTIENGESELLSCHAFT (DE) 1992-07-07 US disclosed
EP-0483717-A2 Polymer blends KURARAY CO., LTD. (JP) 1992-05-06 EP disclosed