SCHEMBL907311

SCHEMBL907311

Nc1c(-c2ccccc2)cc(-c2cccc3ccccc23)c(-c2ccccc2)c1N

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 4/20 0.42
CA1 P00915 4/20 0.42
CA2 P00918 4/20 0.42
CA9 Q16790 4/20 0.42
ALDH1A1 P00352 4/20 0.41
HPGD P15428 3/20 0.41
KDM4E B2RXH2 2/20 0.41
MAPT P10636 2/20 0.41
MEN1 O00255 1/20 0.41
MPI P34949 1/20 0.41
KMT2A Q03164 1/20 0.41
HSD17B10 Q99714 3/20 0.40
TSHR P16473 2/20 0.40
TP53 P04637 1/20 0.40
NFKB1 P19838 1/20 0.40
MAPK1 P28482 1/20 0.40
NFKB2 Q00653 1/20 0.40
RELA Q04206 1/20 0.40
ATM Q13315 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29836839 1.00 CA12 (0.42) CA12CA1CA2CA9ALDH1A1
SCHEMBL30332544 0.92 CA12 (0.41) CA12CA1CA2CA9ALDH1A1
SCHEMBL4922368 0.83 ALDH1A1 (0.41) CA12CA1CA2CA9ALDH1A1
SCHEMBL28140312 0.83 DHFR (0.44) CA12CA1CA2CA9ALDH1A1
SCHEMBL28596645 0.81 CA12 (0.45) CA12CA1CA2CA9ALDH1A1
SCHEMBL31656349 0.81 CA12 (0.45) CA12CA1CA2CA9ALDH1A1
SCHEMBL21046679 0.80 HSD17B10 (0.44) ALDH1A1HPGDKDM4EMAPTMEN1
SCHEMBL30594444 0.80 HSD17B10 (0.44) ALDH1A1HPGDKDM4EMAPTMEN1
SCHEMBL30021913 0.80 ALDH1A1 (0.41) CA12CA1CA2CA9ALDH1A1
SCHEMBL6472955 0.80 KDM4E (0.46) CA12CA1CA2CA9ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167566-B1 Apparatus for and method of vacuum vapor deposition PANASONIC ELEC WORKS CO LTD (JP) 2011-01-26 EP disclosed
CN-100422380-C Equipment and method for vacuum evaporation plating and organic fluorescent device MATSUSHITA ELECTRIC WORKS LTD (JP) 2008-10-01 CN disclosed
US-6696096-B2 Apparatus for and method of vacuum vapor deposition and organic electroluminescent device MATSUSHITA ELECTRIC WORKS, LTD. (JP) 2004-02-24 US disclosed
US-20020017245-A1 Apparatus for and method of vacuum vapor deposition and organic electroluminescent device MATSUSHITA ELECTRIC WORKS, LTD. (JP) 2002-02-14 US disclosed
CN-1333385-A Equipment and method for vacuum evaporation plating and organic fluorescent device MATSUSHITA ELECTRIC WORKS LTD (JP) 2002-01-30 CN disclosed
EP-1167566-A1 Apparatus for and method of vacuum vapor deposition and organic electroluminescent device Matsushita Electric Works, Ltd. (JP) 2002-01-02 EP disclosed