Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSD | P07339 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL137721 | 0.81 | CTSD (0.32) | CTSD | |
| Fluoride Ion SCHEMBL5613214 | 0.76 | CTSD (0.32) | CTSD | |
| SCHEMBL4576329 | 0.76 | CTSD (0.32) | CTSD | |
| Bromide SCHEMBL7870145 | 0.76 | CTSD (0.32) | CTSD | |
| Potassium Ion SCHEMBL8652402 | 0.74 | CTSD (0.31) | CTSD | |
| Hydrochloric Acid SCHEMBL9079594 | 0.73 | — | — | |
| Hydrochloric Acid SCHEMBL28592292 | 0.73 | — | — | |
| Hydrochloric Acid SCHEMBL7178433 | 0.70 | — | — | |
| SCHEMBL2230540 | 0.69 | CTSD (0.43) | CTSD | |
| Hydrochloric Acid SCHEMBL4459913 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113168093-B | Pattern forming method, photosensitive resin composition, cured film, laminate, and device | 富士胶片株式会社 | 2024-04-30 | — | — | CN | disclosed |
| CN-113383273-B | Photosensitive resin composition, pattern forming method, cured film, laminate, and device | 富士胶片株式会社 | 2023-11-14 | — | — | CN | disclosed |
| CN-100509872-C | Olefin polymerization catalyst composition comprising group 13 amide derivatives | DOW GLOBAL TECHNOLOGIES INC (US) | 2009-07-08 | — | — | CN | disclosed |
| CN-100351275-C | Morphology controlled olefin polymerization process | DOW GLOBAL TECHNOLOGIES INC (US) | 2007-11-28 | — | — | CN | disclosed |
| CN-1764674-A | Morphology controlled olefin polymerization process | DOW GLOBAL TECHNOLOGIES INC (US) | 2006-04-26 | — | — | CN | disclosed |
| CN-1726233-A | Olefin polymerization catalyst composition comprising group 13 amide derivatives | DOW GLOBAL TECHNOLOGIES INC (US) | 2006-01-25 | — | — | CN | disclosed |
| CN-1120849-C | Highly soluble olefin polymerization catalyst activators | DOW GLOBAL TECHNOLOGY CO (US) | 2003-09-10 | — | — | CN | disclosed |
| CN-1334845-A | Hot melt adhesive polypropylene/ethylene polymer fibers and compositions for making the same | DOW CHEMICAL CO (US) | 2002-02-06 | — | — | CN | disclosed |
| CN-1214699-A | Highly soluble olefin polymerization catalyst activator | DOW CHEMICAL CO (US) | 1999-04-21 | — | — | CN | disclosed |
| CN-1214698-A | Solution polymerization process with dispersed catalyst activator | DOW CHEMICAL CO (US) | 1999-04-21 | — | — | CN | disclosed |
| EP-0714394-A1 | ANTIPSYCHOTIC METHOD | NOVO NORDISK A/S (DK) | 1996-06-05 | — | — | EP | disclosed |
| WO-1995005379-A1 | ANTIPSYCHOTIC METHOD | NOVO NORDISK A/S (DK) | 1995-02-23 | — | — | WO | disclosed |