SCHEMBL9105345

SCHEMBL9105345

Cc1ccc(C(=O)OCC2CO2)c(C(=O)O)c1C

nearest known ligand 0.48

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
DHFR P00374 1/20 0.41
MGLL Q99685 5/20 0.40
ALDH1A1 P00352 1/20 0.39
MAPK1 P28482 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
NPC1 O15118 1/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1177370 0.92 DHFR (0.43) DHFRMGLLALDH1A1MAPK1L3MBTL1
SCHEMBL29763757 0.85 DHFR (0.44) DHFRMGLLALDH1A1MAPK1L3MBTL1
SCHEMBL19732909 0.83 DHFR (0.49) DHFRMGLLALDH1A1MAPK1L3MBTL1
SCHEMBL2779445 0.82 DHFR (0.48) DHFRMGLLALDH1A1MAPK1L3MBTL1
SCHEMBL5772028 0.81 TSHR (0.52) ALDH1A1MAPK1MEN1KMT2A
SCHEMBL2493818 0.79 DHFR (0.42) DHFRMGLLALDH1A1NPC1MEN1
SCHEMBL1643685 0.79 ALDH1A1 (0.47) DHFRMGLLALDH1A1L3MBTL1
SCHEMBL1714071 0.78 DHFR (0.54) DHFRMGLLALDH1A1MAPK1L3MBTL1
SCHEMBL27669934 0.78 DHFR (0.49) DHFRMGLLMAPK1L3MBTL1
SCHEMBL27689055 0.78 CSNK2A1 (0.41) DHFRMGLLALDH1A1MAPK1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230340253-A1 RESIN COMPOSITION AND SHAPED ARTICLE KURARAY CO., LTD. (JP) 2023-10-26 US disclosed
EP-4219574-A1 RESIN COMPOSITION AND MOLDED ARTICLE Kuraray Co., Ltd. (JP) 2023-08-02 EP disclosed
CN-110133963-B Photosensitive polyimide composition and photoresist film made from same 新应材股份有限公司 2023-03-28 CN disclosed
CN-113728056-A Latent heat storage material 株式会社钟化 2021-11-30 CN disclosed
US-11029598-B2 Photosensitive polyimide composition and photoresist film made thereof ECHEM SOLUTIONS CORP. (TW) 2021-06-08 US disclosed
CN-112638983-A Improvements in or relating to curing agents 赫克塞尔合成有限公司 2021-04-09 CN disclosed
WO-2020203749-A1 LATENT HEAT STORAGE MATERIAL 株式会社カネカ 2020-10-08 WO disclosed
CN-111511809-A Curing agent composition and resin composition containing same 赫克塞尔合成有限公司 2020-08-07 CN disclosed
US-20190243241-A1 Photosensitive Polyimide Composition and Photoresist Film Made Thereof ECHEM SOLUTIONS CORP (TW) 2019-08-08 US disclosed
US-20180215913-A1 HIGH-TEMPERATURE OIL RESISTANT MOLDED COMPONENT FOR AUTOMOBILE YAZAKI CORPORATION (JP) 2018-08-02 US disclosed
US-9929068-B2 Film-like wafer mold material, molded wafer, and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-27 US disclosed
EP-2500934-B1 Film-like wafer mold material and molded wafer SHINETSU CHEMICAL CO (JP) 2015-10-21 EP disclosed
US-20120235284-A1 FILM-LIKE WAFER MOLD MATERIAL, MOLDED WAFER, AND SEMICONDUCTOR DEVICE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-09-20 US disclosed
EP-2500934-A2 Film-like wafer mold material, molded wafer, and semiconductor device Shin-Etsu Chemical Co., Ltd. (JP) 2012-09-19 EP disclosed
US-20120139131-A1 WAFER MOLD MATERIAL AND METHOD FOR MANUFACTURING SEMICONDUCTOR APPARATUS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-07 US disclosed
EP-2461356-A1 Wafer mold material and method for manufacturing semiconductor apparatus Shin-Etsu Chemical Co., Ltd. (JP) 2012-06-06 EP disclosed