Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.55 |
| ▸ | MAPT | P10636 | 2/20 | 0.51 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.45 |
| ▸ | TSHR | P16473 | 3/20 | 0.42 |
| ▸ | CES2 | O00748 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | USP2 | O75604 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.38 |
| ▸ | ATM | Q13315 | 1/20 | 0.38 |
| ▸ | PLA2G2C | Q5R387 | 1/20 | 0.38 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL562161 | 0.89 | HSD17B10 (0.59) | ALDH1A1MAPTHSD17B10TSHRTDP1 | |
| SCHEMBL3380873 | 0.89 | TDP1 (0.53) | ALDH1A1MAPTHSD17B10TSHRCES2 | |
| Acetic Acid Butyl Ester SCHEMBL9314217 | 0.87 | ALDH1A1 (0.64) | ALDH1A1MAPTHSD17B10TSHRHPGD | |
| SCHEMBL6866329 | 0.87 | TDP1 (0.51) | ALDH1A1MAPTHSD17B10TSHRCES2 | |
| SCHEMBL9067467 | 0.86 | ALDH1A1 (0.53) | ALDH1A1MAPTHSD17B10TSHRCES2 | |
| Ethyl Acetate SCHEMBL28848831 | 0.86 | ALDH1A1 (0.52) | ALDH1A1MAPTHSD17B10TSHRCES2 | |
| Acetic Acid Pentyl Ester SCHEMBL27678838 | 0.84 | ALDH1A1 (0.60) | ALDH1A1MAPTHSD17B10TSHRCES2 | |
| SCHEMBL3284798 | 0.84 | MAPT (0.59) | ALDH1A1MAPTHSD17B10TSHRHPGD | |
| Methyl Alcohol SCHEMBL16195772 | 0.83 | TDP1 (0.47) | ALDH1A1MAPTHSD17B10TSHRCES2 | |
| Propylene Glycol SCHEMBL29060970 | 0.82 | ALDH1A1 (0.57) | ALDH1A1MAPTHSD17B10TSHRCES2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 175 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170059987-A1 | THINNER COMPOSITION | DONGWOO FINE-CHEM CO., LTD. (KR) | 2017-03-02 | — | — | US | claimed |
| US-9568830-B2 | Thinner composition for improving coating and removing performance of resist | DONGWOO FINE-CHEM CO., LTD. (KR) | 2017-02-14 | — | — | US | claimed |
| US-20150355545-A1 | THINNER COMPOSITION FOR IMPROVING COATING AND REMOVING PERFORMANCE OF RESIST | DONGWOO FINE-CHEM CO., LTD. (KR) | 2015-12-10 | — | — | US | claimed |
| WO-2015135864-A1 | PHOTOSENSITIVE POLYMER RESIN, PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME, AND LAYER MADE THEREFROM | SOLVAY SA (BE) | 2015-09-17 | — | — | WO | claimed |
| EP-2918616-A1 | Photosensitive polymer resin, photosensitive resin composition comprising the same, and layer made therefrom | Solvay SA (BE) | 2015-09-16 | — | — | EP | claimed |
| US-8470914-B2 | Photosensitive polyimide and photosensitive resin composition comprising the same | LG CHEM, LTD. (KR) | 2013-06-25 | — | — | US | claimed |
| EP-2546697-A2 | PHOTOSENSITIVE ORGANIC INSULATION COMPOSITION FOR AN OLED DEVICE | LG Chem, Ltd. (KR) | 2013-01-16 | — | — | EP | claimed |
| US-20110223538-A1 | PHOTOSENSITIVE ORGANIC INSULATOR COMPOSITION FOR OLED DEVICE | LG CHEM. LTD. (KR) | 2011-09-15 | — | — | US | claimed |
| US-20110046277-A1 | PHOTOSENSITIVE POLYIMIDE AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME | LG CHEM. LTD. (KR) | 2011-02-24 | — | — | US | claimed |
| US-20260118751-A1 | ORGANOMETALLIC COMPOUND, RESIST COMPOSITION COMPRISING THE SAME, AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-04-30 | — | — | US | disclosed |
| US-20260093178-A1 | POLYMER, METHOD OF PRODUCING THE SAME, RESIST COMPOSITION INCLUDING THE POLYMER, AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-04-02 | — | — | US | disclosed |
| US-20250333554-A1 | POLYMER, RESIST COMPOSITION COMPRISING THE SAME AND PATTERN FORMATION METHOD USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-10-30 | — | — | US | disclosed |
| US-20250123563-A1 | POLYMER, RESIST COMPOSITION COMPRISING THE SAME AND METHOD OF FORMING PATTERN USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-04-17 | — | — | US | disclosed |
| US-20250102906-A1 | ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-03-27 | — | — | US | disclosed |
| EP-1237042-A2 | Bottom anti-reflective coat forming composition for lithography | Nissan Chemical Industries, Ltd. (JP) | 2002-09-04 | — | — | EP | disclosed |
| US-20020103316-A1 | Surface active agent containing fluorine and coating compositions using the same | DAINIPPON INK. AND CHEMICALS, INC. (JP) | 2002-08-01 | — | — | US | disclosed |
| US-6384168-B1 | COPOLYMER OF FLUORINATED ALKYL ACRYLATES AND SHORT CHAIN SILICONE (METH)ACRYLATES; REDUCED SURFACE LOSS ENERGY; LEVELING | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2002-05-07 | — | — | US | disclosed |
| US-6313244-B1 | USED IN COATING PAINTS OR LAMINATES WITH UNIFORMITY AND SURFACE SMOOTHNESS BY A SPRAY COATING, AND IN FIELD OF COATING THIN COAT OF PHOTO-RESIST CONTAINING A PHOTO-SENSITIZER BY A SPIN-COATING FOR THE PRODUCTION OF | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2001-11-06 | — | — | US | disclosed |
| EP-1085003-A1 | HIGH-PURITY 1,3-PROPANEDIOL DERIVATIVE SOLVENT, PROCESS FOR PRODUCING THE SAME, AND USE THEREOF | DAICEL CHEMICAL INDUSTRIES, Ltd. (JP) | 2001-03-21 | — | — | EP | disclosed |
| US-6156860-A | Surface active agent containing fluorine and coating compositions using the same | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2000-12-05 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250102906-A1 | ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION | PRMT1, RER1, RCOR1 | ALDH1A1 1815/4885MAPT 2739/4885HSD17B10 3018/4885 |
| US-20260093178-A1 | POLYMER, METHOD OF PRODUCING THE SAME, RESIST COMPOSITION INCLUDING THE POLYMER, AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION | RPS21, CA11, RPL21 | ALDH1A1 1875/4885MAPT 4485/4885HSD17B10 1028/4885 |
| US-20260118751-A1 | ORGANOMETALLIC COMPOUND, RESIST COMPOSITION COMPRISING THE SAME, AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION | LBR, RER1, MNS1 | ALDH1A1 3752/4885MAPT 3165/4885HSD17B10 4472/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.