Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.59 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.50 |
| ▸ | MAPT | P10636 | 2/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.38 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.38 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.38 |
| ▸ | PGR | P06401 | 1/20 | 0.38 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.38 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.38 |
| ▸ | HTR1A | P08908 | 1/20 | 0.38 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.38 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.38 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.38 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.38 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.38 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL911219 | 0.89 | ALDH1A1 (0.55) | HSD17B10TDP1MAPTALDH1A1TSHR | |
| SCHEMBL3381776 | 0.88 | TDP1 (0.66) | HSD17B10TDP1MAPTALDH1A1TSHR | |
| SCHEMBL15333547 | 0.86 | HSD17B10 (0.47) | HSD17B10TDP1MAPTALDH1A1TSHR | |
| SCHEMBL2152842 | 0.85 | — | — | |
| SCHEMBL2152767 | 0.85 | — | — | |
| SCHEMBL36039 | 0.85 | — | — | |
| Ethyl Acetate SCHEMBL152685 | 0.85 | HSD17B10 (0.67) | HSD17B10TDP1MAPTALDH1A1TSHR | |
| Ether SCHEMBL242693 | 0.83 | ALDH1A1 (0.50) | HSD17B10TDP1MAPTALDH1A1TSHR | |
| Propanol SCHEMBL10320543 | 0.83 | MAPT (0.48) | HSD17B10TDP1MAPTALDH1A1TSHR | |
| Alcohol SCHEMBL11062958 | 0.83 | MAPT (0.47) | HSD17B10TDP1MAPTALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 547 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12216403-B2 | Positive photosensitive resin composition and display device using the same | DONJIN SEMICHEM CO., LTD. (KR) | 2025-02-04 | — | — | US | claimed |
| US-20240118616-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE USING THE SAME | DONGJIN SEMICHEM CO., LTD. (KR) | 2024-04-11 | — | — | US | claimed |
| US-20170059987-A1 | THINNER COMPOSITION | DONGWOO FINE-CHEM CO., LTD. (KR) | 2017-03-02 | — | — | US | claimed |
| US-9568830-B2 | Thinner composition for improving coating and removing performance of resist | DONGWOO FINE-CHEM CO., LTD. (KR) | 2017-02-14 | — | — | US | claimed |
| US-20150355545-A1 | THINNER COMPOSITION FOR IMPROVING COATING AND REMOVING PERFORMANCE OF RESIST | DONGWOO FINE-CHEM CO., LTD. (KR) | 2015-12-10 | — | — | US | claimed |
| EP-2918616-A1 | Photosensitive polymer resin, photosensitive resin composition comprising the same, and layer made therefrom | Solvay SA (BE) | 2015-09-16 | — | — | EP | claimed |
| US-8962741-B2 | Thermally curable resin composition for protective film | LG CHEM, LTD. (KR) | 2015-02-24 | — | — | US | claimed |
| US-8889891-B2 | Method for preparing a furfuranol-based compound and 2-furancarboxylic acid-based compound using an ionic liquid as a solvent | KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) | 2014-11-18 | — | — | US | claimed |
| US-20130345446-A1 | METHOD FOR PREPARING A FURFURANOL-BASED COMPOUND AND 2-FURANCARBOXYLIC ACID-BASED COMPOUND USING AN IONIC LIQUID AS A SOLVENT | SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION (KR) | 2013-12-26 | — | — | US | claimed |
| US-8470914-B2 | Photosensitive polyimide and photosensitive resin composition comprising the same | LG CHEM, LTD. (KR) | 2013-06-25 | — | — | US | claimed |
| EP-2546697-A2 | PHOTOSENSITIVE ORGANIC INSULATION COMPOSITION FOR AN OLED DEVICE | LG Chem, Ltd. (KR) | 2013-01-16 | — | — | EP | claimed |
| US-20120041120-A1 | THERMALLY CURABLE RESIN COMPOSITION FOR PROTECTIVE FILM | LG CHEM. LTD. (KR) | 2012-02-16 | — | — | US | claimed |
| US-20110223538-A1 | PHOTOSENSITIVE ORGANIC INSULATOR COMPOSITION FOR OLED DEVICE | LG CHEM. LTD. (KR) | 2011-09-15 | — | — | US | claimed |
| US-20110046277-A1 | PHOTOSENSITIVE POLYIMIDE AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME | LG CHEM. LTD. (KR) | 2011-02-24 | — | — | US | claimed |
| US-7494761-B2 | Cyclodextrin derivative, photoresist composition including the cyclodextrin derivative and method of forming a pattern using the photoresist composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-02-24 | — | — | US | claimed |
| US-7485407-B2 | Siloxane compound, photoresist composition including the siloxane compound and method of forming a pattern using the photoresist composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-02-03 | — | — | US | claimed |
| US-20080070157-A1 | CYCLODEXTRIN DERIVATIVE, PHOTORESIST COMPOSITION INCLUDING THE CYCLODEXTRIN DERIVATIVE AND METHOD OF FORMING A PATTERN USING THE PHOTORESIST COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-03-20 | — | — | US | claimed |
| US-20080070155-A1 | INCLUSION COMPLEX, PHOTORESIST COMPOSITION HAVING THE INCLUSION COMPLEX AND METHOD OF FORMING A PATTERN USING THE PHOTORESIST COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-03-20 | — | — | US | claimed |
| US-20070148590-A1 | Siloxane compound, photoresist composition including the siloxane compound and method of forming a pattern using the photoresist composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-06-28 | — | — | US | claimed |
| EP-1085003-A1 | HIGH-PURITY 1,3-PROPANEDIOL DERIVATIVE SOLVENT, PROCESS FOR PRODUCING THE SAME, AND USE THEREOF | DAICEL CHEMICAL INDUSTRIES, Ltd. (JP) | 2001-03-21 | — | — | EP | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130345446-A1 | METHOD FOR PREPARING A FURFURANOL-BASED COMPOUND AND 2-FURANCARBOXYLIC ACID-BASED COMPOUND USING AN IONIC LIQUID AS A SOLVENT | PFKFB2, FGFR2, HOGA1 | HSD17B10 413/4885TDP1 3376/4885MAPT 1887/4885 |
| US-20080070157-A1 | CYCLODEXTRIN DERIVATIVE, PHOTORESIST COMPOSITION INCLUDING THE CYCLODEXTRIN DERIVATIVE AND METHOD OF FORMING A PATTERN USING THE PHOTORESIST COMPOSITION | CRY1, DSC1, CSNK1D | HSD17B10 1256/4885TDP1 2037/4885MAPT 464/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.