Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SNCA | P37840 | 3/20 | 0.61 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.56 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.56 |
| ▸ | TP53 | P04637 | 1/20 | 0.56 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.56 |
| ▸ | HPGD | P15428 | 1/20 | 0.56 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.56 |
| ▸ | TSHR | P16473 | 1/20 | 0.56 |
| ▸ | CDC25B | P30305 | 1/20 | 0.56 |
| ▸ | ATM | Q13315 | 1/20 | 0.56 |
| ▸ | TTR | P02766 | 1/20 | 0.55 |
| ▸ | FABP4 | P15090 | 1/20 | 0.55 |
| ▸ | CCNA2 | P20248 | 1/20 | 0.55 |
| ▸ | CDK2 | P24941 | 1/20 | 0.55 |
| ▸ | MAPK14 | Q16539 | 1/20 | 0.55 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.54 |
| ▸ | CASP6 | P55212 | 4/20 | 0.53 |
| ▸ | NSD2 | O96028 | 2/20 | 0.53 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.53 |
| ▸ | PTPN5 | P54829 | 1/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7046526 | 0.88 | CASP6 (0.62) | SNCAALDH1A1HSD17B10TP53CYP3A4 | |
| SCHEMBL2293946 | 0.83 | CASP6 (0.49) | SNCAALDH1A1HSD17B10TP53HPGD | |
| SCHEMBL17000439 | 0.81 | CASP6 (0.56) | SNCAALDH1A1HSD17B10TSHRCASP6 | |
| Sulfuric Acid SCHEMBL4742846 | 0.81 | CDC25B (0.79) | SNCAALDH1A1HSD17B10TP53CYP3A4 | |
| SCHEMBL1339220 | 0.79 | NPC1 (0.64) | HSD17B10CYP3A4CASP6KMT2ATRPV1 | |
| SCHEMBL4110673 | 0.78 | NPC1 (0.62) | HSD17B10CYP3A4CASP6KMT2ATRPV1 | |
| SCHEMBL10934591 | 0.78 | KEAP1 (0.61) | ALDH1A1HSD17B10HPGDALOX15CASP6 | |
| SCHEMBL11437000 | 0.77 | CASP6 (0.49) | SNCAALDH1A1HSD17B10TSHRCASP6 | |
| SCHEMBL11510541 | 0.77 | SNCA (0.62) | SNCAALDH1A1HSD17B10TSHRTTR | |
| SCHEMBL8974280 | 0.77 | TTR (0.59) | SNCAALDH1A1HSD17B10TP53CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7977029-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2011-07-12 | — | — | US | disclosed |
| US-7776512-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-08-17 | — | — | US | disclosed |
| US-7709547-B2 | Ink composition, inkjet recording method, printed material, production method of a planographic printing plate and planographic printing plate | FUJIFILM CORPORATION (JP) | 2010-05-04 | — | — | US | disclosed |
| US-20090148791-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2009-06-11 | — | — | US | disclosed |
| US-7544461-B2 | Near infrared ray activation type positive resin composition | KANSAI PAINT CO., LTD. (JP) | 2009-06-09 | — | — | US | disclosed |
| US-7514201-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2009-04-07 | — | — | US | disclosed |
| US-20090045552-A1 | Positive resist composition for recording medium master, and method of producing recording medium master and method of producing stamper using the same | IMAI GENJI | 2009-02-19 | — | — | US | disclosed |
| US-20080318159-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-12-25 | — | — | US | disclosed |
| US-20080096130-A1 | POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION | 2008-04-24 | — | — | US | disclosed |
| US-7361446-B2 | Sensitivity, high resolution, good pattern profile, used for super-microlithography | FUJIFILM CORPORATION (JP) | 2008-04-22 | — | — | US | disclosed |
| US-7202015-B2 | Positive photoresist composition and pattern making method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-04-10 | — | — | US | disclosed |
| US-7198880-B2 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2007-04-03 | — | — | US | disclosed |
| US-7192681-B2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-20 | — | — | US | disclosed |
| US-7179578-B2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7163776-B2 | Positive-working resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-16 | — | — | US | disclosed |
| US-7160666-B2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-09 | — | — | US | disclosed |
| US-20070003871-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-01-04 | — | — | US | disclosed |
| US-7157206-B2 | Resin containing an acid-decomposable group such as bis(trifluoromethyl)methanol group, to generate alkali-soluble group, and acid generators selected from fluorine-substituted or non-fluorine substituted aromatic or aliphatic carboxylic acid generators or sulfonic acid generators; microlithography | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| US-5476770-A | Solid phase biochemical immobilization | COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) | 1995-12-19 | — | — | US | disclosed |
| US-5258065-A | Containing an monoazo dye; colorimetric analysis | SAKURA COLOR PRODUCTS CORPORATION (JP) | 1993-11-02 | — | — | US | disclosed |