SCHEMBL9139640

SCHEMBL9139640

O=C(O)c1ccc2cccnc2c1O.[HH]

nearest known ligand 0.97

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.97
EGLN1 Q9GZT9 14/20 0.64
LMNA P02545 1/20 0.58
ALOX12 P18054 1/20 0.58
KDM4E B2RXH2 1/20 0.54
KDM6B O15054 1/20 0.54
KDM6A O15550 1/20 0.54
TET3 O43151 1/20 0.54
KDM4A O75164 1/20 0.54
KDM4B O94953 1/20 0.54
KDM5C P41229 1/20 0.54
KDM4D Q6B0I6 1/20 0.54
TET2 Q6N021 1/20 0.54
ALKBH5 Q6P6C2 1/20 0.54
TET1 Q8NFU7 1/20 0.54
FTO Q9C0B1 1/20 0.54
KDM4C Q9H3R0 1/20 0.54
KDM2A Q9Y2K7 1/20 0.54
L3MBTL1 Q9Y468 1/20 0.54
KDM3A Q9Y4C1 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1759043 0.98 ALDH1A1 (1.00) ALDH1A1EGLN1LMNAALOX12KDM4E
SCHEMBL27872555 0.86 ALDH1A1 (0.77) ALDH1A1EGLN1LMNAKDM4EHSP90AA1
SCHEMBL2143721 0.83 ALDH1A1 (0.73) ALDH1A1EGLN1LMNAKDM4EHSP90AA1
SCHEMBL2143864 0.83 ALDH1A1 (0.73) ALDH1A1EGLN1LMNAKDM4EHSP90AA1
SCHEMBL253460 0.83 ALDH1A1 (0.73) ALDH1A1EGLN1
SCHEMBL8885906 0.83 ALDH1A1 (0.73) ALDH1A1EGLN1LMNAKDM4EHSP90AA1
SCHEMBL31023212 0.82 ALDH1A1 (0.71) ALDH1A1EGLN1LMNAALOX12
SCHEMBL6487277 0.82 ALDH1A1 (0.71) ALDH1A1EGLN1LMNAALOX12
SCHEMBL69869 0.81 ALDH1A1 (0.70) ALDH1A1EGLN1LMNAALOX12KDM4E
SCHEMBL8885465 0.81 ALDH1A1 (0.70) ALDH1A1EGLN1LMNAKDM4EHSP90AA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5401604-A Reaction product of polyepoxide, aromatic acid with phenolic hydroxy group, aromatic acid, quinone diazide with sulfonyl group, photoresists NIPPON PAINT CO., LTD. (JP) 1995-03-28 US disclosed