SCHEMBL914714

SCHEMBL914714

CCOP(=O)(O)c1ccc(Cl)cc1

nearest known ligand 0.52

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 1/20 0.48
POLB P06746 1/20 0.48
MEN1 O00255 5/20 0.45
KMT2A Q03164 5/20 0.45
EIF4E P06730 1/20 0.41
ALDH1A1 P00352 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.40
NR1I2 O75469 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
MAPT P10636 2/20 0.40
MMP2 P08253 1/20 0.39
MMP8 P22894 1/20 0.39
MMP14 P50281 1/20 0.39
HPGD P15428 1/20 0.38
RECQL P46063 1/20 0.38
HSD17B10 Q99714 1/20 0.38
HDAC1 Q13547 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6858817 0.82 ESR1 (0.44) POLBMEN1KMT2AALDH1A1MAPT
SCHEMBL16868509 0.82 LMNA (0.54) MEN1KMT2AALDH1A1MAPTHPGD
SCHEMBL11236853 0.82 ALOX15 (0.41) NPC1POLBMEN1KMT2AMMP2
SCHEMBL12229764 0.81 TDP1 (0.40) NPC1POLBMEN1KMT2AALDH1A1
SCHEMBL28011653 0.81 ALDH1A1 (0.41) POLBMEN1KMT2AALDH1A1NR1I2
SCHEMBL12229756 0.81 ALDH1A1 (0.49) POLBMEN1KMT2AALDH1A1NR1I2
SCHEMBL17288999 0.81 ALDH1A1 (0.41) POLBMEN1KMT2AALDH1A1NR1I2
SCHEMBL16868487 0.81 GAA (0.49) NPC1POLBMEN1KMT2AALDH1A1
SCHEMBL14743946 0.80 MEN1 (0.44) NPC1POLBMEN1KMT2AALDH1A1
SCHEMBL914851 0.80 POLB (0.47) NPC1POLBMEN1KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed
US-3950413-A Process for the preparation of phosphonic acid dihalides HOECHST AKTIENGESELLSCHAFT (DT) 1976-04-13 US disclosed