SCHEMBL9147262

SCHEMBL9147262

c1ccc(C[SiH](Cc2ccccc2)c2ccccc2[SiH](Cc2ccccc2)Cc2ccccc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CALM1 P0DP23 1/20 0.43
IDO1 P14902 3/20 0.40
EPHX1 P07099 1/20 0.40
TSHR P16473 4/20 0.39
ALDH1A1 P00352 3/20 0.39
LOXL2 Q9Y4K0 2/20 0.39
TP53 P04637 1/20 0.39
TRPA1 O75762 1/20 0.39
CYP3A4 P08684 2/20 0.39
MAPT P10636 1/20 0.39
MAOB P27338 2/20 0.38
HPGD P15428 1/20 0.38
ALOX15 P16050 1/20 0.38
ALOX12 P18054 1/20 0.38
CASP1 P29466 1/20 0.38
HSD17B10 Q99714 1/20 0.38
SLC6A2 P23975 3/20 0.37
TAAR1 Q96RJ0 3/20 0.37
MAOA P21397 2/20 0.37
CYP2A6 P11509 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8992224 0.78 CALM1 (0.43) CALM1IDO1EPHX1TSHRALDH1A1
SCHEMBL41196 0.73 CALM1 (0.50) CALM1IDO1TSHRALDH1A1LOXL2
Hydrochloric Acid SCHEMBL29160220 0.71 CALM1 (0.47) CALM1IDO1TSHRALDH1A1LOXL2
Fluoride SCHEMBL27669418 0.71 CALM1 (0.47) CALM1IDO1TSHRALDH1A1LOXL2
SCHEMBL9422248 0.71 CALM1 (0.47) CALM1IDO1TSHRALDH1A1LOXL2
SCHEMBL10824368 0.70 CALM1 (0.36) CALM1IDO1EPHX1TSHRALDH1A1
SCHEMBL703318 0.69 TP53 (0.48) CALM1IDO1TSHRALDH1A1LOXL2
SCHEMBL8380375 0.69 CALM1 (0.45) CALM1IDO1TSHRALDH1A1LOXL2
SCHEMBL819896 0.69 TSHR (0.48) CALM1IDO1TSHRALDH1A1LOXL2
SCHEMBL22283488 0.69 CALM1 (0.45) CALM1IDO1TSHRALDH1A1LOXL2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5449800-A Silicon-containing pentacyclic compound, a silicon-containing ladder polymer, and methods for producing the same DIRECTOR-GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 1995-09-12 US disclosed