SCHEMBL914841

SCHEMBL914841

COC(=O)c1ccc(C(=O)c2ccc(CP(=O)(O)O)cc2)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LOXL2 Q9Y4K0 1/20 0.54
MAPT P10636 2/20 0.51
CYP4A11 Q02928 2/20 0.50
CYP4F2 P78329 1/20 0.49
CA1 P00915 4/20 0.47
CA2 P00918 4/20 0.47
CA12 O43570 2/20 0.47
CA9 Q16790 2/20 0.47
CA14 Q9ULX7 2/20 0.47
TDP1 Q9NUW8 1/20 0.47
CA7 P43166 1/20 0.47
MEN1 O00255 1/20 0.45
KMT2A Q03164 1/20 0.45
TSHR P16473 2/20 0.44
ALDH1A1 P00352 2/20 0.44
KDM4E B2RXH2 1/20 0.44
NPC1 O15118 1/20 0.44
GAA P10253 1/20 0.44
HPGD P15428 1/20 0.44
MAPK1 P28482 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL916306 0.95 LOXL2 (0.59) LOXL2MAPTCYP4A11CYP4F2CA1
SCHEMBL915162 0.90 LOXL2 (0.54) LOXL2MAPTCYP4A11CYP4F2CA1
SCHEMBL916671 0.90 LOXL2 (0.54) LOXL2MAPTCYP4A11CYP4F2CA1
SCHEMBL915428 0.87 MAPT (0.51) LOXL2MAPTCYP4A11CYP4F2CA1
SCHEMBL915228 0.86 LOXL2 (0.50) LOXL2MAPTCYP4A11CYP4F2CA1
SCHEMBL915271 0.84 CA1 (0.51) LOXL2MAPTCYP4A11CYP4F2CA1
SCHEMBL914874 0.84 POLB (0.55) LOXL2MAPTCYP4A11CYP4F2CA1
SCHEMBL916358 0.84 LOXL2 (0.49) LOXL2MAPTCYP4A11CYP4F2CA1
SCHEMBL2337244 0.80 CA1 (0.70) LOXL2MAPTCYP4A11CA1CA2
SCHEMBL9219228 0.79 LOXL2 (0.58) LOXL2MAPTCYP4A11CYP4F2CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
CN-101208371-B Method for preparing polyester and polyester manufactured by the method as well as polyester formed body TOYO BOSEKI 2011-08-10 CN disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
CN-101208371-A Method for preparing polyester and polyester manufactured by the method as well as polyester formed body TOYO BOSEKI (JP) 2008-06-25 CN disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed