SCHEMBL915271

SCHEMBL915271

COC(=O)c1ccc(C(C)(C)c2ccc(CP(=O)(O)O)cc2)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 4/20 0.51
CA2 P00918 4/20 0.51
MAPT P10636 3/20 0.50
LOXL2 Q9Y4K0 1/20 0.49
PGK1 P00558 1/20 0.46
PGK2 P07205 1/20 0.46
POLB P06746 1/20 0.46
CYP4A11 Q02928 2/20 0.45
CYP4F2 P78329 1/20 0.44
RAB9A P51151 2/20 0.42
TDP1 Q9NUW8 2/20 0.42
CA12 O43570 1/20 0.42
CA7 P43166 1/20 0.42
CA9 Q16790 1/20 0.42
CA14 Q9ULX7 1/20 0.42
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
NPC1 O15118 1/20 0.42
EPHX2 P34913 1/20 0.42
NR1H4 Q96RI1 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL916306 0.89 LOXL2 (0.59) CA1CA2MAPTLOXL2CYP4A11
SCHEMBL914204 0.86 CA1 (0.47) CA1CA2MAPTLOXL2POLB
SCHEMBL914841 0.84 LOXL2 (0.54) CA1CA2MAPTLOXL2CYP4A11
SCHEMBL916671 0.84 LOXL2 (0.54) CA1CA2MAPTLOXL2CYP4A11
SCHEMBL915162 0.84 LOXL2 (0.54) CA1CA2MAPTLOXL2CYP4A11
SCHEMBL915820 0.83 EPHX2 (0.51) PGK1PGK2MEN1KMT2AEPHX2
SCHEMBL2890249 0.82 CA1 (0.59) CA1CA2MAPTLOXL2POLB
SCHEMBL915428 0.82 MAPT (0.51) CA1CA2MAPTLOXL2CYP4A11
SCHEMBL915228 0.81 LOXL2 (0.50) CA1CA2MAPTLOXL2CYP4A11
SCHEMBL914874 0.79 POLB (0.55) CA1CA2MAPTLOXL2POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
CN-101263175-A Polyester, process for production of polyester, and polyester molded article TOYO BOSEKI (JP) 2008-09-10 CN disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed