SCHEMBL915428

SCHEMBL915428

COC(=O)c1ccc(Oc2ccc(CP(=O)(O)O)cc2)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.51
CA1 P00915 3/20 0.51
CA2 P00918 3/20 0.51
LOXL2 Q9Y4K0 1/20 0.51
RAB9A P51151 5/20 0.48
NPC1 O15118 4/20 0.48
SMN1; SMN2 Q16637 3/20 0.48
KMT2A Q03164 2/20 0.48
MEN1 O00255 1/20 0.48
CYP4A11 Q02928 2/20 0.47
CYP4F2 P78329 1/20 0.46
HPGD P15428 1/20 0.46
TSHR P16473 1/20 0.46
HTT P42858 1/20 0.46
TDP1 Q9NUW8 1/20 0.44
CA12 O43570 1/20 0.44
CA7 P43166 1/20 0.44
CA9 Q16790 1/20 0.44
CA14 Q9ULX7 1/20 0.44
STS P08842 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL916306 0.92 LOXL2 (0.59) MAPTCA1CA2LOXL2NPC1
SCHEMBL916671 0.87 LOXL2 (0.54) MAPTCA1CA2LOXL2RAB9A
SCHEMBL914841 0.87 LOXL2 (0.54) MAPTCA1CA2LOXL2NPC1
SCHEMBL915162 0.87 LOXL2 (0.54) MAPTCA1CA2LOXL2NPC1
SCHEMBL916261 0.85 MAPT (0.47) MAPTCA1CA2LOXL2RAB9A
SCHEMBL915228 0.83 LOXL2 (0.50) MAPTCA1CA2LOXL2RAB9A
SCHEMBL915533 0.82 SRD5A2 (0.60) CA1CA2RAB9ANPC1SMN1; SMN2
SCHEMBL915271 0.82 CA1 (0.51) MAPTCA1CA2LOXL2RAB9A
SCHEMBL914874 0.82 POLB (0.55) MAPTCA1CA2LOXL2KMT2A
SCHEMBL9234845 0.82 CA1 (0.60) MAPTCA1CA2LOXL2RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed