SCHEMBL914906

SCHEMBL914906

O=C(O)c1ccc(Sc2ccc(CP(=O)(O)O)cc2)cc1

nearest known ligand 0.51

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.44
PGK1 P00558 4/20 0.43
PGK2 P07205 4/20 0.43
TP53 P04637 1/20 0.41
TSHR P16473 1/20 0.41
HPGD P15428 2/20 0.41
LMNA P02545 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
APEX1 P27695 2/20 0.41
RARB P10826 1/20 0.41
RARG P13631 1/20 0.41
RXRA P19793 1/20 0.41
RXRB P28702 1/20 0.41
RXRG P48443 1/20 0.41
KDM4E B2RXH2 1/20 0.41
ENPP2 Q13822 1/20 0.40
HTT P42858 1/20 0.39
KMT2A Q03164 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915496 0.89 ALDH1A1 (0.54) ALDH1A1PGK1PGK2TP53TSHR
SCHEMBL914774 0.84 SRD5A2 (0.53) ALDH1A1PGK1PGK2TP53TSHR
SCHEMBL914954 0.84 RARB (0.51) ALDH1A1PGK1PGK2TP53TSHR
SCHEMBL914666 0.84 SRD5A2 (0.58) ALDH1A1PGK1PGK2TP53TSHR
SCHEMBL915291 0.82 ALDH1A1 (0.45) ALDH1A1HPGDLMNAL3MBTL1RARB
SCHEMBL915228 0.81 LOXL2 (0.50) ALDH1A1TSHRHPGDLMNAL3MBTL1
SCHEMBL915395 0.80 NR1H2 (0.54) PGK1PGK2ENPP2
SCHEMBL915533 0.79 SRD5A2 (0.60) ALDH1A1HPGDRXRARXRB
SCHEMBL15220060 0.79 TSHR (0.67) ALDH1A1TP53TSHRHPGDLMNA
SCHEMBL15220063 0.79 TSHR (0.67) ALDH1A1TP53TSHRHPGDLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed