SCHEMBL915533

SCHEMBL915533

O=C(O)c1ccc(Oc2ccc(CP(=O)(O)O)cc2)cc1

nearest known ligand 0.60

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
SRD5A2 P31213 4/20 0.60
PARP15 Q460N3 1/20 0.53
PARP10 Q53GL7 1/20 0.53
STAT3 P40763 1/20 0.46
PTGES O14684 1/20 0.46
RXRA P19793 3/20 0.45
RXRB P28702 3/20 0.45
NR4A2 P43354 3/20 0.45
NPC1 O15118 1/20 0.45
POLB P06746 1/20 0.45
RAB9A P51151 1/20 0.45
SMN1; SMN2 Q16637 1/20 0.45
HPGD P15428 1/20 0.45
NR4A1 P22736 1/20 0.45
NR4A3 Q92570 1/20 0.45
CA1 P00915 1/20 0.44
CA2 P00918 1/20 0.44
ALDH1A1 P00352 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915496 0.89 ALDH1A1 (0.54) SRD5A2POLBSMN1; SMN2NR4A1CA1
SCHEMBL914954 0.84 RARB (0.51) SRD5A2RXRARXRBCA1CA2
SCHEMBL914666 0.84 SRD5A2 (0.58) SRD5A2ALDH1A1
SCHEMBL914774 0.84 SRD5A2 (0.53) SRD5A2RXRARXRBCA1CA2
SCHEMBL915339 0.83 SRD5A2 (0.53) SRD5A2PARP15PARP10PTGESRXRA
SCHEMBL915428 0.82 MAPT (0.51) NPC1RAB9ASMN1; SMN2HPGDCA1
SCHEMBL914588 0.80 PTPN1 (0.54) PARP10
SCHEMBL9243055 0.80 SRD5A2 (0.70) SRD5A2PARP15PARP10PTGESRXRA
SCHEMBL5581537 0.80 SRD5A2 (0.89) SRD5A2PARP15PARP10PTGESRXRA
SCHEMBL15668343 0.79 PGR (0.68) NPC1RAB9ASMN1; SMN2CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed