SCHEMBL9152486

SCHEMBL9152486

O=C(O)c1cc(Oc2ccc(Oc3cc(C(=O)O)c(C(=O)O)c(C(F)(F)F)c3)cc2)cc(C(F)(F)F)c1C(=O)O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ POLB P06746 2/20 0.42
▸ ASPH Q12797 1/20 0.38
▸ AR P10275 2/20 0.37
▸ ALDH1A1 P00352 2/20 0.37
▸ TDP1 Q9NUW8 2/20 0.36
▸ TLR8 Q9NR97 1/20 0.36
▸ LMNA P02545 1/20 0.36
▸ MEN1 O00255 1/20 0.36
▸ TTR P02766 1/20 0.36
▸ PPOX P50336 1/20 0.36
▸ KMT2A Q03164 1/20 0.36
▸ SCN9A Q15858 1/20 0.36
▸ APEX1 P27695 1/20 0.36
▸ CTDSP1 Q9GZU7 1/20 0.36
▸ L3MBTL1 Q9Y468 1/20 0.36
▸ TAS2R14 Q9NYV8 2/20 0.36
▸ AKR1C3 P42330 1/20 0.36
▸ AKR1C2 P52895 1/20 0.36
▸ KDM4E B2RXH2 1/20 0.36
▸ HPGD P15428 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29962893 1.00 POLB (0.42) POLBASPHARALDH1A1TDP1
SCHEMBL29962299 0.95 AKR1C2 (0.40) POLBASPHTDP1SCN9AAKR1C2
SCHEMBL9251468 0.95 AKR1C2 (0.40) POLBASPHTDP1SCN9AAKR1C2
SCHEMBL3176700 0.95 ASPH (0.41) POLBASPHALDH1A1TDP1MEN1
SCHEMBL29140668 0.94 POLB (0.43) POLBALDH1A1TLR8TAS2R14AKR1C3
SCHEMBL29962860 0.90 MEN1 (0.43) POLBARTDP1MEN1TTR
SCHEMBL9151921 0.90 MEN1 (0.43) POLBARTDP1MEN1TTR
SCHEMBL9156726 0.89 AKR1C2 (0.39) POLBTDP1TLR8SCN9AAKR1C2
Ether SCHEMBL9156718 0.87 RXRA (0.39) POLBALDH1A1SCN9AL3MBTL1AKR1C3
SCHEMBL29140655 0.84 MRGPRX4 (0.43) ARALDH1A1TAS2R14KDM4EHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0373952-B1 Photosensitive resin composition and photosensitive element using the same HITACHI CHEMICAL CO LTD (JP) 1995-02-08 — — EP disclosed
US-5262277-A Light sensitive elements for electrical thick films with heat resistance HITACHI CHEMICAL COMPANY, INC. (JP) 1993-11-16 — — US disclosed
EP-0373952-A2 Photosensitive resin composition and photosensitive element using the same Hitachi Chemical Co., Ltd. (JP) 1990-06-20 — — EP disclosed
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