SCHEMBL915249

SCHEMBL915249

CCOP(=O)(O)Cc1cc2ccccc2o1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AGXT P21549 1/20 0.46
LOXL2 Q9Y4K0 1/20 0.46
MAOB P27338 1/20 0.42
TAS1R3 Q7RTX0 1/20 0.42
TAS1R1 Q7RTX1 1/20 0.42
HTR1A P08908 3/20 0.41
DRD2 P14416 3/20 0.41
HTR2B P41595 3/20 0.41
RAB9A P51151 3/20 0.41
MAPT P10636 3/20 0.41
CASP3 P42574 2/20 0.41
SENP7 Q9BQF6 2/20 0.41
SENP6 Q9GZR1 2/20 0.41
NPC1 O15118 2/20 0.41
KMT2A Q03164 2/20 0.41
TP53 P04637 1/20 0.41
SENP8 Q96LD8 1/20 0.41
MEN1 O00255 1/20 0.41
TSHR P16473 1/20 0.41
MAPK1 P28482 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL914470 0.87 MAPT (0.49) AGXTLOXL2MAOBTAS1R3TAS1R1
SCHEMBL915192 0.81 LOXL2 (0.55) AGXTLOXL2MAOBHTR1AHTR2B
SCHEMBL5947962 0.72 MAOB (0.52) AGXTLOXL2MAOBRAB9AMAPT
SCHEMBL515109 0.71 LOXL2 (0.64) AGXTLOXL2HTR1ADRD2HTR2B
SCHEMBL31499129 0.71 LOXL2 (0.64) AGXTLOXL2HTR1ADRD2HTR2B
SCHEMBL24087673 0.71 AGXT (0.64) AGXTLOXL2MAOBHTR1ADRD2
SCHEMBL31688361 0.71 CYP1A2 (0.50) HTR2BRAB9ACASP3SENP7SENP6
SCHEMBL914661 0.71 NR1I2 (0.55) KMT2AMEN1HSD17B10POLBL3MBTL1
SCHEMBL915284 0.71 CYP1A2 (0.50) HTR2BRAB9ACASP3SENP7SENP6
SCHEMBL5544514 0.71 LOXL2 (0.58) AGXTLOXL2MAOBTAS1R3TAS1R1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed