SCHEMBL915192

SCHEMBL915192

O=P(O)(O)Cc1cc2ccccc2o1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LOXL2 Q9Y4K0 1/20 0.55
AGXT P21549 1/20 0.50
FLT3 P36888 1/20 0.46
ESR1 P03372 1/20 0.46
ESR2 Q92731 1/20 0.46
HPGD P15428 2/20 0.44
TYR P14679 1/20 0.44
DAO P14920 1/20 0.44
AKR1B1 P15121 1/20 0.44
MAOB P27338 2/20 0.44
ACP3 P15309 1/20 0.43
TP53 P04637 2/20 0.43
SMN1; SMN2 Q16637 2/20 0.43
HTR1A P08908 1/20 0.43
HTR2B P41595 1/20 0.43
PIN1 Q13526 1/20 0.43
ALDH1A1 P00352 1/20 0.43
CYP19A1 P11511 1/20 0.42
HSD17B10 Q99714 2/20 0.42
KDM4E B2RXH2 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2872113 0.82 AGXT (0.44) LOXL2AGXTFLT3ESR1ESR2
SCHEMBL915249 0.81 AGXT (0.46) LOXL2AGXTESR1ESR2MAOB
SCHEMBL1325816 0.78 MMP2 (0.54) HPGDTYRDAOAKR1B1MAOB
SCHEMBL2863444 0.77 TP53 (0.44) LOXL2AGXTFLT3TP53HTR1A
SCHEMBL914470 0.76 MAPT (0.49) LOXL2AGXTHPGDMAOBSMN1; SMN2
SCHEMBL118929 0.75 LOXL2 (0.64) LOXL2AGXTFLT3ESR1ESR2
SCHEMBL2090461 0.75 LOXL2 (0.64) LOXL2AGXTFLT3ESR1ESR2
SCHEMBL29724180 0.75 LOXL2 (0.64) LOXL2AGXTFLT3ESR1ESR2
SCHEMBL14075637 0.74 LOXL2 (0.69) LOXL2AGXTFLT3ESR1ESR2
SCHEMBL7171559 0.74 ESR1 (0.59) LOXL2AGXTFLT3ESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed