SCHEMBL915331

SCHEMBL915331

CCOP(=O)(O)Cc1cccc(OCCO)c1

nearest known ligand 0.48

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
GGPS1 O95749 2/20 0.48
MAPK1 P28482 2/20 0.44
L3MBTL1 Q9Y468 2/20 0.44
TSHR P16473 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
POLB P06746 1/20 0.43
ALDH1A1 P00352 3/20 0.41
RECQL P46063 1/20 0.41
CETP P11597 1/20 0.41
KDM4E B2RXH2 2/20 0.40
GAA P10253 1/20 0.40
PPARD Q03181 1/20 0.40
CYP2D6 P10635 4/20 0.40
ROCK2 O75116 1/20 0.40
CYP3A4 P08684 1/20 0.40
CYP2C9 P11712 1/20 0.40
ROCK1 Q13464 1/20 0.40
CYP4F2 P78329 1/20 0.39
CYP4A11 Q02928 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915498 0.89 GGPS1 (0.45) GGPS1MAPK1L3MBTL1TSHRTDP1
SCHEMBL916934 0.89 GGPS1 (0.48) GGPS1MAPK1L3MBTL1TSHRTDP1
SCHEMBL915542 0.85 PPARD (0.44) GGPS1POLBALDH1A1RECQLPPARD
SCHEMBL31688389 0.84 PGK1 (0.47) GGPS1POLBALDH1A1RECQLCYP4F2
SCHEMBL917168 0.84 PGK1 (0.47) GGPS1POLBALDH1A1RECQLCYP4F2
SCHEMBL915499 0.83 GGPS1 (0.44) GGPS1MAPK1L3MBTL1TSHRTDP1
SCHEMBL914815 0.82 NR1I2 (0.46) MAPK1L3MBTL1ALDH1A1RECQLGAA
SCHEMBL28437720 0.82 MMP13 (0.48) ALDH1A1
SCHEMBL915282 0.80 S1PR1 (0.46) MAPK1ALDH1A1RECQLGAAPPARD
SCHEMBL915696 0.79 PTPN1 (0.43) MAPK1ALDH1A1RECQLKDM4EGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed