SCHEMBL915443

SCHEMBL915443

CCOP(=O)(O)Cc1ccc(C(=O)O)cc1

nearest known ligand 0.53

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.53
RXRA P19793 2/20 0.45
RXRB P28702 2/20 0.45
HDAC1 Q13547 1/20 0.45
RARB P10826 6/20 0.44
CETP P11597 3/20 0.43
PLA2G4B P0C869 1/20 0.42
KMT2A Q03164 2/20 0.42
NPC1 O15118 1/20 0.41
POLB P06746 1/20 0.41
RAB9A P51151 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
MEN1 O00255 1/20 0.41
RARA P10276 1/20 0.41
MAPT P10636 1/20 0.41
MTOR P42345 1/20 0.41
TP53 P04637 1/20 0.41
TSHR P16473 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL914759 0.95 SRD5A2 (0.49) ALDH1A1RXRARXRBHDAC1RARB
SCHEMBL915593 0.95 SRD5A2 (0.49) ALDH1A1RXRARXRBHDAC1RARB
SCHEMBL914762 0.95 RARB (0.51) ALDH1A1RXRARXRBHDAC1RARB
SCHEMBL915339 0.92 SRD5A2 (0.53) ALDH1A1RXRARXRBHDAC1CETP
SCHEMBL915291 0.91 ALDH1A1 (0.45) ALDH1A1RXRARXRBHDAC1RARB
SCHEMBL914626 0.90 EPHX2 (0.46) ALDH1A1RXRARXRBHDAC1RARB
SCHEMBL915500 0.90 ALDH1A1 (0.44) ALDH1A1HDAC1KMT2APOLBRAB9A
SCHEMBL17488978 0.87 PPARD (0.50) HDAC1CETPPOLBSMN1; SMN2TSHR
SCHEMBL454324 0.86 ALDH1A1 (0.53) ALDH1A1RXRARXRBHDAC1RARB
SCHEMBL2209005 0.85 ALDH1A1 (0.52) ALDH1A1RXRARXRBHDAC1RARB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109265700-B Chiral supermolecule metal phosphonate crystal material, preparation method and application 辽宁师范大学 2021-06-11 CN claimed
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
CN-109265700-B Chiral supermolecule metal phosphonate crystal material, preparation method and application 辽宁师范大学 2021-06-11 CN disclosed
CN-109265700-B Chiral supermolecule metal phosphonate crystal material, preparation method and application 辽宁师范大学 2021-06-11 CN disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed