SCHEMBL915593

SCHEMBL915593

CCOP(=O)(O)Cc1ccc(Cc2ccc(C(=O)O)cc2)cc1

nearest known ligand 0.49

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
SRD5A2 P31213 3/20 0.49
ALDH1A1 P00352 1/20 0.49
HDAC1 Q13547 1/20 0.42
RXRA P19793 2/20 0.42
RXRB P28702 2/20 0.42
KMT2A Q03164 2/20 0.42
RXRG P48443 1/20 0.41
LMNA P02545 2/20 0.41
CA12 O43570 1/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
CA9 Q16790 1/20 0.41
CA14 Q9ULX7 1/20 0.41
RARB P10826 2/20 0.41
TSHR P16473 1/20 0.41
CETP P11597 3/20 0.40
PLA2G4B P0C869 1/20 0.40
MEN1 O00255 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915443 0.95 ALDH1A1 (0.53) ALDH1A1HDAC1RXRARXRBKMT2A
SCHEMBL914759 0.91 SRD5A2 (0.49) SRD5A2ALDH1A1HDAC1RXRARXRB
SCHEMBL914762 0.91 RARB (0.51) ALDH1A1HDAC1RXRARXRBKMT2A
SCHEMBL915339 0.88 SRD5A2 (0.53) SRD5A2ALDH1A1HDAC1RXRARXRB
SCHEMBL915291 0.87 ALDH1A1 (0.45) ALDH1A1HDAC1RXRARXRBKMT2A
SCHEMBL914626 0.85 EPHX2 (0.46) SRD5A2ALDH1A1HDAC1RXRARXRB
SCHEMBL915500 0.85 ALDH1A1 (0.44) ALDH1A1HDAC1KMT2ACA12CA1
SCHEMBL915650 0.85 LOXL2 (0.49) ALDH1A1HDAC1KMT2ALMNACA12
SCHEMBL17488978 0.83 PPARD (0.50) HDAC1TSHRCETP
SCHEMBL454324 0.82 ALDH1A1 (0.53) SRD5A2ALDH1A1HDAC1RXRARXRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed