SCHEMBL915509

SCHEMBL915509

CCOP(=O)(O)Cc1ccc(C(C)(C)c2ccc(OCCO)cc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 4/20 0.46
CYP3A4 P08684 1/20 0.46
KDM4E B2RXH2 8/20 0.42
MEN1 O00255 4/20 0.42
KMT2A Q03164 4/20 0.42
POLB P06746 2/20 0.42
LMNA P02545 2/20 0.42
S1PR1 P21453 3/20 0.40
ALDH1A1 P00352 4/20 0.39
NR1I2 O75469 1/20 0.39
S1PR4 O95977 2/20 0.39
S1PR3 Q99500 2/20 0.39
S1PR5 Q9H228 2/20 0.39
HTT P42858 2/20 0.39
EPHX2 P34913 1/20 0.39
NR1H4 Q96RI1 1/20 0.39
PTPRC P08575 1/20 0.38
PTPN2 P17706 1/20 0.38
PTPN1 P18031 1/20 0.38
PTPRB P23467 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL914815 0.91 NR1I2 (0.46) SMN1; SMN2CYP3A4MEN1KMT2ALMNA
SCHEMBL915837 0.90 KDM4E (0.44) SMN1; SMN2KDM4EMEN1KMT2APOLB
SCHEMBL4452534 0.90 EPHX2 (0.40) SMN1; SMN2KDM4EMEN1KMT2APOLB
SCHEMBL915282 0.88 S1PR1 (0.46) SMN1; SMN2CYP3A4MEN1KMT2ALMNA
SCHEMBL915129 0.87 SMN1; SMN2 (0.50) SMN1; SMN2CYP3A4KDM4EMEN1KMT2A
SCHEMBL916357 0.87 NR1I2 (0.43) SMN1; SMN2CYP3A4MEN1KMT2ALMNA
SCHEMBL915696 0.87 PTPN1 (0.43) SMN1; SMN2CYP3A4KDM4EMEN1KMT2A
SCHEMBL914845 0.83 GAA (0.55) SMN1; SMN2KMT2ALMNAS1PR1ALDH1A1
SCHEMBL914605 0.83 NR1I2 (0.40) SMN1; SMN2CYP3A4MEN1KMT2ALMNA
SCHEMBL915529 0.82 GAA (0.44) SMN1; SMN2CYP3A4KMT2ALMNAS1PR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed